Issued Patents 2023
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11726413 | Overlay marks for reducing effect of bottom layer asymmetry | Hung-Chih Hsieh, Po-Chung Cheng | 2023-08-15 |
| 11656391 | Aperture design and methods thereof | Hung-Chih Hsieh, Kai-Chiang Wu, Yen-Liang Chen, Po-Chung Cheng, Chih-Ming Ke | 2023-05-23 |