Issued Patents All Time
Showing 276–300 of 378 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9281273 | Designed-based interconnect structure in semiconductor structure | Chih-Liang Chen, Chih-Ming Lai, Yung-Sung Yen, Kam-Tou Sio, Tsong-Hua Ou +3 more | 2016-03-08 |
| 9262578 | Method for integrated circuit manufacturing | Hung-Chun Wang, Ching-Hsu Chang, Feng-Ju Chang, Chun-Hung Wu, Ping-Chieh Wu +5 more | 2016-02-16 |
| 9256709 | Method for integrated circuit mask patterning | Jue-Chin Yu, Lun Hsieh, Pi-Tsung Chen, Shuo-Yen Chou | 2016-02-09 |
| 9252021 | Method for patterning a plurality of features for Fin-like field-effect transistor (FinFET) devices | Hoi-Tou Ng, Kuei-Liang Lu, Ming-Feng Shieh | 2016-02-02 |
| 9245763 | Mechanisms for forming patterns using multiple lithography processes | Shih-Ming Chang, Ming-Feng Shieh, Chih-Ming Lai, Tsai-Sheng Gau | 2016-01-26 |
| 9214356 | Mechanisms for forming patterns | Chung-Te Lin, Ming-Feng Shieh, Shih-Ming Chang, Tsai-Sheng Gau | 2015-12-15 |
| 9189588 | Polygon-based optical proximity correction | Wen-Li Cheng, Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Cheng-Lung Tsai +3 more | 2015-11-17 |
| 9189587 | Chip level critical point analysis with manufacturer specific data | I-Chang Shih, Jen-Chieh Lo, Tzu-Chin Lin, Ping-Chieh Wu, Ying-Chou Cheng +1 more | 2015-11-17 |
| 9177797 | Lithography using high selectivity spacers for pitch reduction | Yu-Sheng Chang, Chung-Ju Lee, Cheng-Hsiung Tsai, Yung-Hsu Wu, Hsiang-Huan Lee +5 more | 2015-11-03 |
| 9176373 | System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patterns | Wen-Li Cheng, Ming-Hui Chih, Chia-Ping Chiang, Ken-Hsien Hsieh, Tsong-Hua Ou +1 more | 2015-11-03 |
| 9165106 | Layout design for electron-beam high volume manufacturing | Hung-Chun Wang, Shao-Yun Fang, Tzu-Chin Lin, Wen-Chun Huang | 2015-10-20 |
| 9165095 | Target point generation for optical proximity correction | Ming-Hui Chih, Wen-Li Cheng, Yu-Po Tang, Ping-Chieh Wu, Chia-Ping Chiang +2 more | 2015-10-20 |
| 9159577 | Method of forming substrate pattern | Chun Lin, Feng-Yuan Chiu, Bing Yeh, Yi-Jie Chen, Ying-Chou Cheng +2 more | 2015-10-13 |
| 9153478 | Spacer etching process for integrated circuit design | Shih-Ming Chang, Ken-Hsien Hsieh, Ming-Feng Shieh, Chih-Ming Lai, Tsai-Sheng Gau +6 more | 2015-10-06 |
| 9136168 | Conductive line patterning | Tung-Heng Hsieh, Tsung-Chieh Tsai, Juing-Yi Wu, Liang-Yao Lee, Jyh-Kang Ting | 2015-09-15 |
| 9136106 | Method for integrated circuit patterning | Chieh-Han Wu, Chung-Ju Lee, Cheng-Hsiung Tsai, Ming-Feng Shieh, Tien-I Bao +1 more | 2015-09-15 |
| 9091930 | Enhanced EUV lithography system | Ching-Hsu Chang, Nian-Fuh Cheng, Chih-Shiang Chou, Wen-Chun Huang | 2015-07-28 |
| 9070630 | Mechanisms for forming patterns | Chung-Te Lin, Ming-Feng Shieh, Tsai-Sheng Gau, Shih-Ming Chang | 2015-06-30 |
| 9069249 | Self aligned patterning with multiple resist layers | Ming-Feng Shieh, Ken-Hsien Hsieh, Shih-Ming Chang, Chih-Ming Lai | 2015-06-30 |
| 9054159 | Method of patterning a feature of a semiconductor device | Yen-Chun Huang, Ming-Feng Shieh, Ken-Hsien Hsieh, Chih-Ming Lai, Tsai-Sheng Gau | 2015-06-09 |
| 9040433 | Photo resist trimmed line end space | Chia-Ying Lee, Jyu-Horng Shieh, Ming-Feng Shieh, Shih-Ming Chang, Chih-Ming Lai +1 more | 2015-05-26 |
| 9026957 | Method of defining an intensity selective exposure photomask | Chia-Chu Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2015-05-05 |
| 9026955 | Methodology for pattern correction | Hung-Chun Wang, Ming-Hui Chih, Ping-Chieh Wu, Chun-Hung Wu, Feng-Ju Chang +2 more | 2015-05-05 |
| 9003336 | Mask assignment optimization | Wen-Chun Huang, Ken-Hsien Hsieh, Ming-Hui Chih, Chih-Ming Lai, Ko-Bin Kao +4 more | 2015-04-07 |
| 8987008 | Integrated circuit layout and method with double patterning | Ming-Feng Shieh, Hung-Chang Hsieh, Tsai-Sheng Gau, Yao-Ching Ku | 2015-03-24 |