Issued Patents All Time
Showing 326–350 of 378 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8728892 | Adaptive fin design for FinFETs | Tsong-Hua Ou, Shu-Min Chen, Pin-Dai Sue, Li-Chun Tien | 2014-05-20 |
| 8730473 | Multiple edge enabled patterning | Ming-Feng Shieh, Ya Hui Chang, Tsong-Hua Ou, Ken-Hsien Hsieh, Burn Jeng Lin | 2014-05-20 |
| 8681326 | Method and apparatus for monitoring mask process impact on lithography performance | Ping-Chieh Wu, Chien-Hsun Chen, Wen-Chun Huang, Chih-Ming Lai, Boren Luo | 2014-03-25 |
| 8683392 | Double patterning methodology | Ken-Hsien Hsieh, Huang-Yu Chen, Jhih-Jian Wang, Cheng Kun Tsai, Tsong-Hua Ou +1 more | 2014-03-25 |
| 8673520 | Intensity selective exposure photomask | George Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2014-03-18 |
| 8631379 | Decomposing integrated circuit layout | Pi-Tsung Chen, Ming-Hui Chih, Ken-Hsien Hsieh, Wei-Long Wang, Wen-Chun Huang +4 more | 2014-01-14 |
| 8631360 | Methodology of optical proximity correction optimization | Hung-Chun Wang, Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Feng-Ju Chang +2 more | 2014-01-14 |
| 8627241 | Pattern correction with location effect | Hung-Chun Wang, Ming-Hui Chih, Cheng Kun Tsai, Wen-Chun Huang | 2014-01-07 |
| 8601407 | Geometric pattern data quality verification for maskless lithography | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Cheng-Hung Chen, Shih-Chi Wang +3 more | 2013-12-03 |
| 8584052 | Cell layout for multiple patterning technology | Huang-Yu Chen, Yuan-Te Hou, Ken-Hsien Hsieh, Lee-Chung Lu | 2013-11-12 |
| 8572519 | Method and apparatus for reducing implant topography reflection effect | Wen-Hao Liu, Hsien-Huang Liao, Chi-Cheng Hung, Wen-Chun Huang | 2013-10-29 |
| 8563198 | Device and method for providing wavelength reduction with a photomask | Burn Jeng Lin, Jeng-Horng Chen, Chun-Kuang Chen, Tsai-Sheng Gau, Jen-Chieh Shih | 2013-10-22 |
| 8527916 | Dissection splitting with optical proximity correction to reduce corner rounding | Chia-Ping Chiang, Tsong-Hua Ou, Yu-Po Tang, Ming-Hui Chih, Wen-Li Cheng +2 more | 2013-09-03 |
| 8527918 | Target-based thermal design using dummy insertion for semiconductor devices | Ying-Chou Cheng, Boren Luo, Wen-Hao Liu, Tsong-Hua Ou, Chih-Wei Hsu +1 more | 2013-09-03 |
| 8507159 | Electron beam data storage system and method for high volume manufacturing | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Jeng-Horng Chen +1 more | 2013-08-13 |
| 8499261 | Method and apparatus of patterning semiconductor device | Ming-Hui Chih, Cheng Kun Tsai, Wen-Chun Huang, Chii-Ping Chen, Jiing-Feng Yang | 2013-07-30 |
| 8477299 | Method and apparatus for monitoring mask process impact on lithography performance | Ping-Chieh Wu, Chien-Hsun Chen, Wen-Chun Huang, Chih-Ming Lai, Boren Luo | 2013-07-02 |
| 8473877 | Striping methodology for maskless lithography | Hung-Chun Wang, Tzu-Chin Lin, Nian-Fuh Cheng, Jeng-Horng Chen, Wen-Chun Huang | 2013-06-25 |
| 8468473 | Method for high volume e-beam lithography | Hung-Chun Wang, Tzu-Chin Lin, Chia-Chi Lin, Nian-Fuh Cheng, Jeng-Horng Chen +1 more | 2013-06-18 |
| 8464186 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Hung-Chun Wang, Jeng-Horng Chen, Shy-Jay Lin, Chia-Ping Chiang, Cheng Kun Tsai +1 more | 2013-06-11 |
| 8431291 | Intensity selective exposure photomask | George Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2013-04-30 |
| 8418111 | Method and apparatus for achieving multiple patterning technology compliant design layout | Huang-Yu Chen, Fang-Yu Fan, Yuan-Te Hou, Lee-Chung Lu, Ken-Hsien Hsieh +3 more | 2013-04-09 |
| 8381139 | Method for metal correlated via split for double patterning | Burn Jeng Lin, Tsai-Sheng Gau, Wen-Chun Huang | 2013-02-19 |
| 8381153 | Dissection splitting with optical proximity correction and mask rule check enforcement | Chia-Ping Chiang, Yu-Po Tang, Ming-Hui Chih, Cheng Kun Tsai, Wei-Long Wang +7 more | 2013-02-19 |
| 8372742 | Method, system, and apparatus for adjusting local and global pattern density of an integrated circuit design | Ying-Chou Cheng, Cheng-Lung Tsai, Tsong-Hua Ou, Cheng Kun Tsai, Wen-Chun Huang | 2013-02-12 |