Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12218239 | Structure and method for providing line end extensions for fin-type active regions | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2025-02-04 |
| 11721761 | Structure and method for providing line end extensions for fin-type active regions | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2023-08-08 |
| 11239365 | Structure and method for providing line end extensions for fin-type active regions | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2022-02-01 |
| 11126774 | Layout optimization of a main pattern and a cut pattern | Shih-Ming Chang | 2021-09-21 |
| 10573751 | Structure and method for providing line end extensions for fin-type active regions | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2020-02-25 |
| 10528693 | Layout optimization of a main pattern and a cut pattern | Shih-Ming Chang | 2020-01-07 |
| 10049885 | Method for patterning a plurality of features for fin-like field-effect transistor (FinFET) devices | Hoi-Tou Ng, Ming-Feng Shieh, Ru-Gun Liu | 2018-08-14 |
| 9983473 | Photomask and method for fabricating integrated circuit | Chun Lin, Yi-Jie Chen, Feng-Yuan Chiu, Ying-Chou Cheng, Ya Hui Chang +2 more | 2018-05-29 |
| 9917192 | Structure and method for transistors with line end extension | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2018-03-13 |
| 9904163 | Cut-mask patterning process for FIN-like field effect transistor (FINFET) device | Wei-De Ho, Ching-Yu Chang, Ming-Feng Shieh | 2018-02-27 |
| 9823574 | Lithography alignment marks | Ching-Huang Chen, Hung-Chang Hsieh, Ya Hui Chang, Spencer B. T. Lin | 2017-11-21 |
| 9805154 | Method of lithography process with inserting scattering bars | Irene Ho, Ai-Jen Hung, Hung-Chang Hsieh, Ya Hui Chang | 2017-10-31 |
| 9673328 | Structure and method for providing line end extensions for fin-type active regions | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2017-06-06 |
| 9612526 | Photomask and method for fabricating integrated circuit | Chun Lin, Yi-Jie Chen, Feng-Yuan Chiu, Ying-Chou Cheng, Ya Hui Chang +2 more | 2017-04-04 |
| 9595440 | Method of using a vaporizing spray system to perform a trimming process | Ching-Yu Chang, Ming-Feng Shieh | 2017-03-14 |
| 9501601 | Layout optimization of a main pattern and a cut pattern | Shih-Ming Chang | 2016-11-22 |
| 9437415 | Layer alignment in FinFET fabrication | Ming-Feng Shieh | 2016-09-06 |
| 9324866 | Structure and method for transistor with line end extension | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2016-04-26 |
| 9252021 | Method for patterning a plurality of features for Fin-like field-effect transistor (FinFET) devices | Hoi-Tou Ng, Ming-Feng Shieh, Ru-Gun Liu | 2016-02-02 |
| 9236267 | Cut-mask patterning process for fin-like field effect transistor (FinFET) device | Ho Wei De, Ming-Feng Shieh, Ching-Yu Chang | 2016-01-12 |
| 9190261 | Layer alignment in FinFET fabrication | Ming-Feng Shieh | 2015-11-17 |
| 9189588 | Polygon-based optical proximity correction | Wen-Li Cheng, Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Cheng-Lung Tsai +3 more | 2015-11-17 |
| 8802569 | Method of fabricating a semiconductor device | Ming-Feng Shieh, Ching-Yu Chang | 2014-08-12 |