Issued Patents All Time
Showing 76–100 of 119 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8243364 | Reflective optical element and EUV lithography appliance | Johann Trenkler, Udo Nothelfer | 2012-08-14 |
| 8208198 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Alexander Epple +2 more | 2012-06-26 |
| 8208199 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Alexander Epple +2 more | 2012-06-26 |
| 8208200 | Imaging optical system | — | 2012-06-26 |
| 8208127 | Combination stop for catoptric projection arrangement | Daniel Kraehmer, Aurelian Dodoc, Toralf Gruner | 2012-06-26 |
| 8199400 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Alexander Epple +2 more | 2012-06-12 |
| 8194230 | Projection objectives having mirror elements with reflective coatings | Danny Chan | 2012-06-05 |
| 8169694 | Catoptric objectives and systems using catoptric objectives | Wilhelm Ulrich, Marco Pretorius | 2012-05-01 |
| 8107054 | Microlithographic projection exposure apparatus | Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann +1 more | 2012-01-31 |
| 8094380 | Projection objective and projection exposure apparatus with negative back focus of the entry pupil | Wolfgang Singer | 2012-01-10 |
| 8027022 | Projection objective | Johannes Zellner, Wilhelm Ulrich | 2011-09-27 |
| 8018650 | Imaging optical system | — | 2011-09-13 |
| 8004755 | Catoptric objectives and systems using catoptric objectives | David Shafer, Wilhelm Ulrich | 2011-08-23 |
| 7999913 | Microlithography projection system with an accessible diaphragm or aperture stop | — | 2011-08-16 |
| 7999917 | Illumination system and microlithographic projection exposure apparatus including same | Johannes Zellner | 2011-08-16 |
| 7982854 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Wolfgang Singer, Toralf Gruner, Olaf Dittmann, Michael Totzeck | 2011-07-19 |
| 7977651 | Illumination system particularly for microlithography | Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2011-07-12 |
| 7973908 | Six-mirror EUV projection system with low incidence angles | — | 2011-07-05 |
| 7929114 | Projection optics for microlithography | — | 2011-04-19 |
| 7914955 | Masks, lithography device and semiconductor component | Martin Lowisch, Wolfgang Singer | 2011-03-29 |
| 7869122 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Alexander Epple | 2011-01-11 |
| 7869138 | Projection objective and projection exposure apparatus with negative back focus of the entry pupil | Wolfgang Singer | 2011-01-11 |
| 7763870 | Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements | Dirk Heinrich Ehm, Hermann Bieg, Stephan Muellender, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn | 2010-07-27 |
| 7712905 | Imaging system with mirror group | David Shafer, Aurelian Dodoc, Alexander Epple | 2010-05-11 |
| 7679821 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Alexander Epple | 2010-03-16 |