Issued Patents All Time
Showing 101–119 of 119 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7672047 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Alexander Epple | 2010-03-02 |
| 7592598 | Illumination system particularly for microlithography | Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2009-09-22 |
| 7522260 | Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components | Andreas Kirchner, Bernhard Kneer | 2009-04-21 |
| 7508580 | 8-mirror microlithography projection objective | Wilhelm Ulrich, Guenther Seitz | 2009-03-24 |
| 7477355 | Projection exposure apparatus and projection optical system | Jean-Noel Fehr, Johannes Zellner | 2009-01-13 |
| 7463422 | Projection exposure apparatus | Vladimir Kamenow, Daniel Kraehmer, Michael Totzeck, Toralf Gruner, Aurelian Dodoc +4 more | 2008-12-09 |
| 7456408 | Illumination system particularly for microlithography | Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2008-11-25 |
| 7450301 | Reflective projection lens for EUV-photolithography | Wilhelm Ulrich, Russel Hudyma | 2008-11-11 |
| 7429116 | Projection objective and method for its manufacture | Stephan Muellender, Johann Trenkler, Hartmut Enkisch | 2008-09-30 |
| 7414781 | Catoptric objectives and systems using catoptric objectives | Wilhelm Ulrich, Marco Pretorius | 2008-08-19 |
| 7385756 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Alexander Epple | 2008-06-10 |
| 7372624 | 8-mirror microlithography projection objective | Wilhelm Ulrich, Guenther Seitz | 2008-05-13 |
| 7369216 | Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby | Johannes Hubertus Josephina Moors, Uwe Mickan, Wolfgang Singer | 2008-05-06 |
| 7348565 | Illumination system particularly for microlithography | Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2008-03-25 |
| 7199922 | Reflective projection lens for EUV-photolithography | Wilhelm Ulrich, Russell Hudyma | 2007-04-03 |
| 7186983 | Illumination system particularly for microlithography | Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2007-03-06 |
| 7085075 | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 | Russell Hudyma, Alexander Epple | 2006-08-01 |
| 6927901 | Reflective projection lens for EUV-photolithography | Wilhelm Ulrich, Russell Hudyma | 2005-08-09 |
| 6859328 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Karl-Hein Schuster, Udo Dinger, Wolfgang Singer +2 more | 2005-02-22 |