Issued Patents All Time
Showing 26–50 of 119 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9244361 | Imaging optical system | Ralf Mueller | 2016-01-26 |
| 9239521 | Projection optics for microlithography | — | 2016-01-19 |
| 9201226 | Imaging optics | Ulrich Loering, Ralf Mueller, Norman Baer | 2015-12-01 |
| 9195145 | Microlithographic imaging optical system including multiple mirrors | Armin Schoeppach, Johannes Zellner | 2015-11-24 |
| 9188771 | Reflective optical imaging system | Aurelian Dodoc, Christoph Zaczek, Sascha Migura, Gerhard Braun, Hans-Jochen Paul | 2015-11-17 |
| 9182578 | Imaging optical system and illumination optical system | Johannes Zellner, Aurelian Dodoc, Marco Pretorius, Christoph Menke, Wilhelm Ulrich +1 more | 2015-11-10 |
| 9152056 | Imaging optical system and projection exposure system for microlithography | — | 2015-10-06 |
| 9146472 | Microlithography projection system with an accessible diaphragm or aperture stop | — | 2015-09-29 |
| 9134626 | Microscope and microscopy method for space-resolved measurement of a predetermined structure, in particular a structure of a lithographic mask | Michael Totzeck, Norbert Kerwien | 2015-09-15 |
| 9057964 | Imaging optics and projection exposure installation for microlithography with an imaging optics | Johannes Zellner, Aurelian Dodoc, Claus Zahlten, Christoph Menke, Marco Pretorius +2 more | 2015-06-16 |
| 9013677 | Imaging optics, microlithography projection exposure apparatus having same and related methods | David Shafer | 2015-04-21 |
| 9013678 | Projection objective having mirror elements with reflective coatings | Danny Chan, Sascha Migura | 2015-04-21 |
| 8982325 | Microlithographic projection exposure apparatus | Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann +1 more | 2015-03-17 |
| 8970819 | Microlithography projection optical system, tool and method of production | Wilhelm Ulrich | 2015-03-03 |
| 8967817 | Imaging optical system with at most 11.6% of the illuminated surfaces of the pupil plane being obscured | — | 2015-03-03 |
| 8953173 | Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate | Wolfgang Singer | 2015-02-10 |
| 8944615 | Projection objective and method for its manufacture | Stephan Muellender, Johann Trenkler, Harmut Enkisch | 2015-02-03 |
| 8908269 | Immersion catadioptric projection objective having two intermediate images | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Alexander Epple +2 more | 2014-12-09 |
| 8891163 | Reflective optical element and EUV lithography appliance | Johann Trenkler, Udo Nothelfer | 2014-11-18 |
| 8873122 | Microlithographic imaging optical system including multiple mirrors | Armin Schoeppach, Johannes Zellner | 2014-10-28 |
| 8842284 | Magnifying imaging optical unit and metrology system including same | — | 2014-09-23 |
| 8837041 | Magnifying imaging optical system and metrology system with an imaging optical system of this type | Heiko Feldmann | 2014-09-16 |
| 8827467 | Magnifying imaging optical unit and metrology system including same | — | 2014-09-09 |
| 8817233 | Illumination optical system for projection lithography | — | 2014-08-26 |
| 8810927 | Projection objective and projection exposure apparatus with negative back focus of the entry pupil | Wolfgang Singer | 2014-08-19 |