Issued Patents All Time
Showing 76–100 of 173 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10204790 | Methods for thin film deposition | Jun Kawahara, Antti Niskanen, Eva Tois, Raija H. Matero, Hidemi Suemori +2 more | 2019-02-12 |
| 10199213 | Sulfur-containing thin films | Fu Tang, Michael Eugene Givens, Jan Willem Maes, Qi Xie | 2019-02-05 |
| 10190213 | Deposition of metal borides | Chiyu Zhu, Kiran Shrestha | 2019-01-29 |
| 10157786 | Selective formation of metallic films on metallic surfaces | Antti Niskanen, Marko Tuominen | 2018-12-18 |
| 10147600 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Ryu Nakano +1 more | 2018-12-04 |
| 10087522 | Deposition of metal borides | Petri Raisanen, Eric James Shero, Robert Brennan Milligan, Michael Eugene Givens | 2018-10-02 |
| 10047435 | Dual selective deposition | Raija H. Matero, Eva Tois, Antti Niskanen, Marko Tuominen, Hannu Huotari +1 more | 2018-08-14 |
| 10049924 | Selective formation of metallic films on metallic surfaces | Antti Niskanen, Marko Tuominen | 2018-08-14 |
| 10043880 | Metal silicide, metal germanide, methods for making the same | Viljami Pore, Tom E. Blomberg, Eva Tois | 2018-08-07 |
| 10002936 | Titanium aluminum and tantalum aluminum thin films | Michael Eugene Givens, Eric James Shero, Jerry Winkler, Petri Raisanen, Timo Asikainen +2 more | 2018-06-19 |
| 9905416 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Atsuki Fukazawa, Hideaki Fukuda | 2018-02-27 |
| 9895715 | Selective deposition of metals, metal oxides, and dielectrics | Raija H. Matero, Eva Tois, Antti Niskanen, Marko Tuominen, Hannu Huotari +2 more | 2018-02-20 |
| 9875893 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Ryu Nakano +1 more | 2018-01-23 |
| 9816180 | Selective deposition | Eva Tois | 2017-11-14 |
| 9812320 | Method and apparatus for filling a gap | Viljami Pore, Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Steven R. A. Van Aerde +2 more | 2017-11-07 |
| 9721786 | Sulfur-containing thin films | Fu Tang, Michael Eugene Givens, Jan Willem Maes, Qi Xie | 2017-08-01 |
| 9677173 | Precursors and methods for atomic layer deposition of transition metal oxides | Timo Hatanpää, Jaakko Niinisto, Mikko Ritala, Markku Leskelä | 2017-06-13 |
| 9679808 | Selective formation of metallic films on metallic surfaces | Antti Niskanen, Marko Tuominen | 2017-06-13 |
| 9631272 | Atomic layer deposition of metal carbide films using aluminum hydrocarbon compounds | Dong Li, Steven Marcus, Wei Li | 2017-04-25 |
| 9634106 | Doped metal germanide and methods for making the same | Viljami Pore, Tom E. Blomberg, Eva Tois | 2017-04-25 |
| 9587307 | Enhanced deposition of noble metals | Marko Tuominen, Antti Rahtu | 2017-03-07 |
| 9583348 | Silane and borane treatments for titanium carbide films | Jerry Chen, Vladimir Machkaoutsan, Brennan Milligan, Jan Willem Maes, Eric James Shero +2 more | 2017-02-28 |
| 9564309 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Atsuki Fukazawa, Hideaki Fukuda | 2017-02-07 |
| 9564314 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Ryu Nakano +1 more | 2017-02-07 |
| 9520562 | Method of making a resistive random access memory | Qi Xie, Jan Willem Maes, Tom E. Blomberg, Marko Tuominen, Robin Roelofs +1 more | 2016-12-13 |