Issued Patents All Time
Showing 26–50 of 116 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9142388 | Capacitively coupled remote plasma source | Daniel Carter, Victor Brouk, Karen Peterson, Randy Grilley | 2015-09-22 |
| 9105447 | Wide dynamic range ion energy bias control; fast ion energy switching; ion energy control and a pulsed bias supply; and a virtual front panel | Victor Brouk, Daniel Carter, Dmitri Kovalevskii | 2015-08-11 |
| 9017533 | Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning | John C. Forster, John Pipitone, Xianmin Tang, Rongjun Wang | 2015-04-28 |
| 8980044 | Plasma reactor with a multiple zone thermal control feed forward control apparatus | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas A. Buchberger, Jr., Douglas H. Burns +5 more | 2015-03-17 |
| 8920611 | Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning | John C. Forster, John Pipitone, Xianming Tang, Rongjun Wang | 2014-12-30 |
| 8884525 | Remote plasma source generating a disc-shaped plasma | Daniel Carter, Randy Grilley, Karen Peterson | 2014-11-11 |
| 8801893 | Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor | Paul Brillhart, Richard Fovell, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera +4 more | 2014-08-12 |
| 8723423 | Electrostatic remote plasma source | Daniel Carter, Victor Brouk, Karen Peterson, Randy Grilley | 2014-05-13 |
| 8647438 | Annular baffle | Kallol Bera | 2014-02-11 |
| 8617351 | Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction | Roger Alan Lindley, Michael Kutney, Martin Jeff Salinas, Hamid Tavassoli, Keiji Horioka +1 more | 2013-12-31 |
| 8608900 | Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes | Douglas A. Buchberger, Jr., Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns +1 more | 2013-12-17 |
| 8607731 | Cathode with inner and outer electrodes at different heights | Douglas A. Buchberger, Jr., Semyon L. Kats, Dan Katz | 2013-12-17 |
| 8563428 | Methods for depositing metal in high aspect ratio features | Karl M. Brown, Alan A. Ritchie, John Pipitone, Ying Rui | 2013-10-22 |
| 8546267 | Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control | Paul Brillhart, Richard Fovell, Douglas A. Buchberger, Jr., Douglas H. Burns, Kallol Bera +4 more | 2013-10-01 |
| 8435379 | Substrate cleaning chamber and cleaning and conditioning methods | Vineet Haresh Mehta, Karl M. Brown, John Pipitone, Steven C. Shannon, Keith A. Miller +1 more | 2013-05-07 |
| 8357264 | Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator | Steven C. Shannon, Kartik Ramaswamy, Matthew L. Miller, Kenneth S. Collins | 2013-01-22 |
| 8337660 | Capacitively coupled plasma reactor having very agile wafer temperature control | Douglas A. Buchberger, Jr., Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns +5 more | 2012-12-25 |
| 8337661 | Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator | Steven C. Shannon, Kartik Ramaswamy, Matthew L. Miller, Kenneth S. Collins | 2012-12-25 |
| 8329586 | Method of processing a workpiece in a plasma reactor using feed forward thermal control | Douglas A. Buchberger, Jr., Paul Brillhart, Richard Fovell, Douglas H. Burns, Kallol Bera +4 more | 2012-12-11 |
| 8324525 | Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator | Steven C. Shannon, Kartik Ramaswamy, Matthew L. Miller, Kenneth S. Collins | 2012-12-04 |
| 8279577 | Substrate support having fluid channel | Andrew Nguyen, Wing Cheng, Hiroji Hanawa, Semyon L. Kats, Kartik Ramaswamy +4 more | 2012-10-02 |
| 8231799 | Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Paul Brillhart +2 more | 2012-07-31 |
| 8221580 | Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops | Douglas A. Buchberger, Jr., Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns +5 more | 2012-07-17 |
| 8157951 | Capacitively coupled plasma reactor having very agile wafer temperature control | Douglas A. Buchberger, Jr., Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns +1 more | 2012-04-17 |
| 8123902 | Gas flow diffuser | Paul Brillhart, James D. Carducci, Xiaoping Zhou, Matthew L. Miller | 2012-02-28 |