Issued Patents 2019
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10522371 | Systems and methods for improved semiconductor etching and component protection | Tien Fak Tan, Lok Kee Loh, Soonwook Jung, Martin Yue Choy, Soonam Park | 2019-12-31 |
| 10504754 | Systems and methods for improved semiconductor etching and component protection | Tien Fak Tan, Lok Kee Loh, Soonwook Jung, Martin Yue Choy, Soonam Park | 2019-12-10 |
| 10504700 | Plasma etching systems and methods with secondary plasma injection | Toan Q. Tran, Soonam Park, Zilu Weng | 2019-12-10 |
| 10504697 | Particle generation suppresor by DC bias modulation | Jonghoon Baek, Soonam Park, Xinglong Chen | 2019-12-10 |
| 10490418 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Soonam Park, Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Jiayin Huang | 2019-11-26 |
| 10468285 | High temperature chuck for plasma processing systems | Toan Q. Tran, Sultan Malik, Shambhu N. Roy, Satoru Kobayashi, Tae Seung Cho +2 more | 2019-11-05 |
| 10468276 | Thermal management systems and methods for wafer processing systems | David Benjaminson | 2019-11-05 |
| 10460915 | Rotatable substrate support having radio frequency applicator | Satoru Kobayashi, Kirby H. Floyd, Hiroji Hanawa, Soonam Park | 2019-10-29 |
| 10453655 | Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion | Satoru Kobayashi, Hideo Sugai, Soonam Park, Kartik Ramaswamy | 2019-10-22 |
| 10431435 | Wafer carrier with independent isolated heater zones | Son T. Nguyen, Anh N. Nguyen, David Palagashvill | 2019-10-01 |
| 10431429 | Systems and methods for radial and azimuthal control of plasma uniformity | Satoru Kobayashi, Hideo Sugai, Nikolai Kalnin, Soonam Park, Toan Q. Tran | 2019-10-01 |
| 10424485 | Enhanced etching processes using remote plasma sources | Nitin K. Ingle, Xinglong Chen, Shankar Venkataraman | 2019-09-24 |
| 10364197 | Heat treated ceramic substrate having ceramic coating | Jennifer Y. Sun, Ren-Guan Duan, Biraja P. Kanungo | 2019-07-30 |
| 10354843 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Soonam Park, Jang-Gyoo Yang +4 more | 2019-07-16 |
| 10340124 | Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide | Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Soonam Park | 2019-07-02 |
| 10319649 | Optical emission spectroscopy (OES) for remote plasma monitoring | Tae Seung Cho, Soonam Park, Junghoon Kim, Shankar Venkataraman | 2019-06-11 |
| 10297458 | Process window widening using coated parts in plasma etch processes | Dongqing Yang, Tien Fak Tan, Peter M. Hillman, Lala Zhu, Nitin K. Ingle +2 more | 2019-05-21 |
| 10283321 | Semiconductor processing system and methods using capacitively coupled plasma | Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Kien N. Chuc, Qiwei Liang +1 more | 2019-05-07 |
| 10271416 | High efficiency triple-coil inductively coupled plasma source with phase control | Samer Banna, Waheb Bishara, Ryan Giar, Valentin N. Todorow, Kyle Tantiwong | 2019-04-23 |
| 10253406 | Method for forming yttrium oxide on semiconductor processing equipment | Laksheswar Kalita, Prerna Goradia, Geetika Bajaj, Yogita Pareek, Yixing Lin +4 more | 2019-04-09 |
| 10256079 | Semiconductor processing systems having multiple plasma configurations | Xinglong Chen, Shankar Venkataraman | 2019-04-09 |
| 10233554 | Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment | Yogita Pareek, Laksheswar Kalita, Geetika Bajaj, Kevin A. PAPKE, Ankur Kadam +3 more | 2019-03-19 |
| 10224180 | Chamber with flow-through source | — | 2019-03-05 |
| 10224210 | Plasma processing system with direct outlet toroidal plasma source | — | 2019-03-05 |
| 10214815 | Surface treated aluminum nitride baffle | Muhammad M. Rasheed | 2019-02-26 |