| 10474033 |
Method and apparatus for post exposure processing of photoresist wafers |
Viachslav Babayan, Douglas A. Buchberger, Jr., Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more |
2019-11-12 |
| 10431427 |
Monopole antenna array source with phase shifted zones for semiconductor process equipment |
Srinivas D. Nemani |
2019-10-01 |
| 10358715 |
Integrated cluster tool for selective area deposition |
Tobin Kaufman-Osborn, Srinivas D. Nemani, Ludovic Godet, Adib Khan |
2019-07-23 |
| 10354843 |
Chemical control features in wafer process equipment |
Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more |
2019-07-16 |
| 10283321 |
Semiconductor processing system and methods using capacitively coupled plasma |
Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Kien N. Chuc, Shankar Venkataraman +1 more |
2019-05-07 |
| 10269541 |
Workpiece processing chamber having a thermal controlled microwave window |
Michael W. Stowell |
2019-04-23 |
| 10240232 |
Gas control in process chamber |
Srinivas D. Nemani, Ellie Yieh |
2019-03-26 |
| 10224224 |
High pressure wafer processing systems and related methods |
Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik, Sean S. Kang +1 more |
2019-03-05 |
| 10203604 |
Method and apparatus for post exposure processing of photoresist wafers |
Viachslav Babayan, Douglas A. Buchberger, Jr., Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more |
2019-02-12 |
| 10179941 |
Gas delivery system for high pressure processing chamber |
Adib Khan, Sultan Malik, Keith Tatseun Wong, Srinivas D. Nemani |
2019-01-15 |
