Issued Patents 2019
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10474033 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-11-12 |
| 10453656 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2019-10-22 |
| 10386126 | Apparatus for controlling temperature uniformity of a substrate | Kallol Bera, Xiaoping Zhou, Andrew Nguyen, Hamid Tavassoli, Surajit Kumar +1 more | 2019-08-20 |
| 10304715 | Electrostatic chuck having thermally isolated zones with minimal crosstalk | Vijay D. Parkhe, Konstantin Makhratchev, Jason Della Rosa, Hamid Noorbakhsh, Brad L. Mays | 2019-05-28 |
| 10203604 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-02-12 |