Issued Patents 2019
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10468285 | High temperature chuck for plasma processing systems | Toan Q. Tran, Sultan Malik, Dmitry Lubomirsky, Shambhu N. Roy, Satoru Kobayashi +2 more | 2019-11-05 |
| 10424485 | Enhanced etching processes using remote plasma sources | Nitin K. Ingle, Dmitry Lubomirsky, Xinglong Chen | 2019-09-24 |
| 10354843 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park +4 more | 2019-07-16 |
| 10319649 | Optical emission spectroscopy (OES) for remote plasma monitoring | Tae Seung Cho, Soonam Park, Junghoon Kim, Dmitry Lubomirsky | 2019-06-11 |
| 10283321 | Semiconductor processing system and methods using capacitively coupled plasma | Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Kien N. Chuc, Qiwei Liang +1 more | 2019-05-07 |
| 10256079 | Semiconductor processing systems having multiple plasma configurations | Dmitry Lubomirsky, Xinglong Chen | 2019-04-09 |
| 10170282 | Insulated semiconductor faceplate designs | Xinglong Chen, Dmitry Lubomirsky | 2019-01-01 |