| 10522371 |
Systems and methods for improved semiconductor etching and component protection |
Tien Fak Tan, Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy |
2019-12-31 |
| 10504754 |
Systems and methods for improved semiconductor etching and component protection |
Tien Fak Tan, Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy |
2019-12-10 |
| 10504700 |
Plasma etching systems and methods with secondary plasma injection |
Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky |
2019-12-10 |
| 10504697 |
Particle generation suppresor by DC bias modulation |
Jonghoon Baek, Xinglong Chen, Dmitry Lubomirsky |
2019-12-10 |
| 10490418 |
Systems and methods for internal surface conditioning assessment in plasma processing equipment |
Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang |
2019-11-26 |
| 10468285 |
High temperature chuck for plasma processing systems |
Toan Q. Tran, Sultan Malik, Dmitry Lubomirsky, Shambhu N. Roy, Satoru Kobayashi +2 more |
2019-11-05 |
| 10460915 |
Rotatable substrate support having radio frequency applicator |
Satoru Kobayashi, Kirby H. Floyd, Hiroji Hanawa, Dmitry Lubomirsky |
2019-10-29 |
| 10453655 |
Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion |
Satoru Kobayashi, Hideo Sugai, Kartik Ramaswamy, Dmitry Lubomirsky |
2019-10-22 |
| 10431429 |
Systems and methods for radial and azimuthal control of plasma uniformity |
Satoru Kobayashi, Hideo Sugai, Nikolai Kalnin, Toan Q. Tran, Dmitry Lubomirsky |
2019-10-01 |
| 10354843 |
Chemical control features in wafer process equipment |
Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Jang-Gyoo Yang +4 more |
2019-07-16 |
| 10340124 |
Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide |
Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Dmitry Lubomirsky |
2019-07-02 |
| 10319649 |
Optical emission spectroscopy (OES) for remote plasma monitoring |
Tae Seung Cho, Junghoon Kim, Dmitry Lubomirsky, Shankar Venkataraman |
2019-06-11 |
