Issued Patents 2019
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10510515 | Processing tool with electrically switched electrode assembly | Kenneth S. Collins, Shahid Rauf, Kallol Bera, James D. Carducci, Michael R. Rice +1 more | 2019-12-17 |
| 10504765 | Electrostatic chuck assembly having a dielectric filler | Anwar Husain, Haitao Wang, Evans Lee, Jaeyong Cho, Hamid Noorbakhsh +3 more | 2019-12-10 |
| 10475626 | Ion-ion plasma atomic layer etch process and reactor | Kenneth S. Collins, James D. Carducci, Shahid Rauf, Leonid Dorf, Yang Yang | 2019-11-12 |
| 10453656 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2019-10-22 |
| 10453655 | Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion | Satoru Kobayashi, Hideo Sugai, Soonam Park, Dmitry Lubomirsky | 2019-10-22 |
| 10418225 | Distributed electrode array for plasma processing | Kenneth S. Collins, Michael R. Rice, James D. Carducci, Yue Guo, Olga Regelman | 2019-09-17 |
| 10395904 | Method of real time in-situ chamber condition monitoring using sensors and RF communication | Lawrence Wong, Yang Yang, Steven Lane, Richard Fovell | 2019-08-27 |
| 10395896 | Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulation | Wonseok Lee, Ankur Agarwal, Haitao Wang | 2019-08-27 |
| 10378108 | Showerhead with reduced backside plasma ignition | Haitao Wang, Hamid Noorbakhsh, Chunlei Zhang, Sergio Fukuda Shoji, Roland Smith +1 more | 2019-08-13 |
| 10373807 | Distributed electrode array for plasma processing | Kenneth S. Collins, Michael R. Rice, James D. Carducci, Yue Guo, Olga Regelman | 2019-08-06 |
| 10312056 | Distributed electrode array for plasma processing | Kenneth S. Collins, Michael R. Rice, James D. Carducci, Yue Guo, Olga Regelman | 2019-06-04 |
| 10249495 | Diamond like carbon layer formed by an electron beam plasma process | Yang Yang, Lucy Chen, Jie Zhou, Kenneth S. Collins, Srinivas D. Nemani +5 more | 2019-04-02 |
| 10249479 | Magnet configurations for radial uniformity tuning of ICP plasmas | Joseph AuBuchon, Tza-Jing Gung, Travis Koh, Nattaworn Boss Nunta, Sheng-Chin Kung +2 more | 2019-04-02 |
| 10249470 | Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding | Jason A. Kenney, James D. Carducci, Kenneth S. Collins, Richard Fovell, Shahid Rauf | 2019-04-02 |
| 10242893 | Method and apparatus for de-chucking a workpiece using a swing voltage sequence | Haitao Wang, Wonseok Lee, Sergio Fukuda Shoji, Chunlei Zhang | 2019-03-26 |
| 10170279 | Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding | Jason A. Kenney, James D. Carducci, Kenneth S. Collins, Richard Fovell, Shahid Rauf | 2019-01-01 |
| 10170278 | Inductively coupled plasma source | Andrew Nguyen, Yang Yang, Steven Lane | 2019-01-01 |