Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10504702 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Rajinder Dhindsa, Sunil Srinivasan, Denis M. Koosau, James Rogers | 2019-12-10 |
| 10475626 | Ion-ion plasma atomic layer etch process and reactor | Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Yang Yang | 2019-11-12 |
| 10448494 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Olivier Luere, Rajinder Dhindsa, James Rogers, Sunil Srinivasan, Anurag Kumar Mishra | 2019-10-15 |
| 10448495 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Olivier Luere, Rajinder Dhindsa, James Rogers, Sunil Srinivasan, Anurag Kumar Mishra | 2019-10-15 |
| 10373804 | System for tunable workpiece biasing in a plasma reactor | Travis Koh, Philip Allan Kraus, Prabu Gopalraja | 2019-08-06 |
| 10312048 | Creating ion energy distribution functions (IEDF) | Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more | 2019-06-04 |