| 10153133 |
Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion |
Satoru Kobayashi, Hideo Sugai, Soonam Park, Kartik Ramaswamy |
2018-12-11 |
| 10147620 |
Bolted wafer chuck thermal management systems and methods for wafer processing systems |
David Benjaminson, Ananda Seelavanth Math, Saravanakumar Natarajan, Shubham Chourey |
2018-12-04 |
| 10096496 |
Process chamber for etching low K and other dielectric films |
Srinivas D. Nemani, Ellie Yieh, Sergey G. Belostotskiy |
2018-10-09 |
| 10062585 |
Oxygen compatible plasma source |
— |
2018-08-28 |
| 10020170 |
Chemistry compatible coating material for advanced device on-wafer particle performance |
Jennifer Y. Sun, Biraja P. Kanungo |
2018-07-10 |
| 10010912 |
Particle reduction via throttle gate valve purge |
Jared Ahmad Lee, Martin Jeff Salinas, Andrew Nguyen, Tom K. Cho, Eric A. Englhardt +1 more |
2018-07-03 |
| 10008366 |
Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing |
Sang Won Kang, Nicholas Celeste, Peter M. Hillman, Douglas B. Hayden, Dongqing Yang |
2018-06-26 |
| 9991134 |
Processing systems and methods for halide scavenging |
Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen +5 more |
2018-06-05 |
| 9975758 |
Wafer processing equipment having exposable sensing layers |
Leonard Tedeschi, Lili Ji, Olivier Joubert, Philip Allan Kraus, Daniel T. McCormick |
2018-05-22 |
| 9978564 |
Chemical control features in wafer process equipment |
Qiwei Liang, Xinglong Chen, Kien N. Chuc, Soonam Park, Jang-Gyoo Yang +4 more |
2018-05-22 |
| 9972477 |
Multiple point gas delivery apparatus for etching materials |
Tien Fak Tan |
2018-05-15 |
| 9966240 |
Systems and methods for internal surface conditioning assessment in plasma processing equipment |
Soonam Park, Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Jiayin Huang |
2018-05-08 |
| 9947559 |
Thermal management of edge ring in semiconductor processing |
Aniruddha Pal, Martin Jeffrey Salinas, Imad Yousif, Andrew Nguyen |
2018-04-17 |
| 9948214 |
High temperature electrostatic chuck with real-time heat zone regulating capability |
Jennifer Y. Sun, Sehn Thach, Xing Lin, Michael D. Willwerth, Konstantin Makhratchev |
2018-04-17 |
| 9934942 |
Chamber with flow-through source |
— |
2018-04-03 |
| 9922840 |
Adjustable remote dissociation |
Soonam Park, Kenneth D. Schatz, Soonwook Jung |
2018-03-20 |
| 9903020 |
Generation of compact alumina passivation layers on aluminum plasma equipment components |
Sung Je Kim, Laksheswar Kalita, Yogita Pareek, Ankur Kadam, Prerna Goradia +1 more |
2018-02-27 |
| 9892888 |
Particle generation suppresor by DC bias modulation |
Jonghoon Baek, Soonam Park, Xinglong Chen |
2018-02-13 |
| 9885117 |
Conditioned semiconductor system parts |
Sung Je Kim |
2018-02-06 |
| 9874524 |
In-situ spatially resolved plasma monitoring by using optical emission spectroscopy |
Tae Seung Cho, Junghoon Kim, Soonwook Jung, Soonam Park |
2018-01-23 |
