| 10153133 |
Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion |
Satoru Kobayashi, Hideo Sugai, Kartik Ramaswamy, Dmitry Lubomirsky |
2018-12-11 |
| 10032606 |
Semiconductor processing with DC assisted RF power for improved control |
Jang-Gyoo Yang, Xinglong Chen, Jonghoon Baek, Saurabh Garg, Shankar Venkataraman |
2018-07-24 |
| 9978564 |
Chemical control features in wafer process equipment |
Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Jang-Gyoo Yang +4 more |
2018-05-22 |
| 9966240 |
Systems and methods for internal surface conditioning assessment in plasma processing equipment |
Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang |
2018-05-08 |
| 9947549 |
Cobalt-containing material removal |
Xikun Wang, Zhenjiang Cui, Nitin K. Ingle |
2018-04-17 |
| 9922840 |
Adjustable remote dissociation |
Kenneth D. Schatz, Soonwook Jung, Dmitry Lubomirsky |
2018-03-20 |
| 9892888 |
Particle generation suppresor by DC bias modulation |
Jonghoon Baek, Xinglong Chen, Dmitry Lubomirsky |
2018-02-13 |
| 9874524 |
In-situ spatially resolved plasma monitoring by using optical emission spectroscopy |
Tae Seung Cho, Junghoon Kim, Soonwook Jung, Dmitry Lubomirsky |
2018-01-23 |
