Issued Patents 2018
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10163696 | Selective cobalt removal for bottom up gapfill | Xikun Wang, Jianxin Lei, Roey Shaviv | 2018-12-25 |
| 10128086 | Silicon pretreatment for nitride removal | Jiayin Huang, Zhijun Chen, Anchuan Wang | 2018-11-13 |
| 10113236 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Shankar Venkataraman, Jay D. Pinson, II, Jang-Gyoo Yang, Qiwei Liang | 2018-10-30 |
| 10062579 | Selective SiN lateral recess | Zhijun Chen, Jiayin Huang, Anchuan Wang | 2018-08-28 |
| 10062578 | Methods for etch of metal and metal-oxide films | Jingchun Zhang, Anchuan Wang | 2018-08-28 |
| 10049891 | Selective in situ cobalt residue removal | Xikun Wang | 2018-08-14 |
| 10043684 | Self-limiting atomic thermal etching systems and methods | Ranga Rao Arnepalli, Prerna Goradia, Robert Jan Visser, Mikhail Korolik, Jayeeta Biswas +1 more | 2018-08-07 |
| 10043674 | Germanium etching systems and methods | Mikhail Korolik, Dimitri Kioussis | 2018-08-07 |
| 10026621 | SiN spacer profile patterning | Jungmin Ko, Tom Choi, Kwang Soo Kim, Theodore Wou | 2018-07-17 |
| 10026597 | Hydrogen plasma based cleaning process for etch hardware | Chirantha Rodrigo, Jingchun Zhang, Lili Ji, Anchuan Wang | 2018-07-17 |
| 9991134 | Processing systems and methods for halide scavenging | Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen +5 more | 2018-06-05 |
| 9966240 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Soonam Park, Yufei Zhu, Edwin C. Suarez, Dmitry Lubomirsky, Jiayin Huang | 2018-05-08 |
| 9960045 | Charge-trap layer separation and word-line isolation for enhanced 3-D NAND structure | Vinod R. Purayath | 2018-05-01 |
| 9947549 | Cobalt-containing material removal | Xikun Wang, Zhenjiang Cui, Soonam Park | 2018-04-17 |
| 9896770 | Methods of etching films with reduced surface roughness | Benjamin Schmiege, Srinivas D. Nemani, Jeffrey W. Anthis, Xikun Wang, Jie Liu +1 more | 2018-02-20 |
| 9887096 | Differential silicon oxide etch | Seung Ho Park, Yunyu Wang, Jingchun Zhang, Anchuan Wang | 2018-02-06 |
| 9875907 | Self-aligned shielding of silicon oxide | Fei Wang, Mikhail Korolik, Anchuan Wang, Robert Jan Visser | 2018-01-23 |
| 9859128 | Self-aligned shielding of silicon oxide | Fei Wang, Mikhail Korolik, Anchuan Wang, Robert Jan Visser | 2018-01-02 |