| 10134581 |
Methods and apparatus for selective dry etch |
Ning Li, Mihaela Balseanu, Li-Qun Xia, Dongqing Yang |
2018-11-20 |
| 10128086 |
Silicon pretreatment for nitride removal |
Jiayin Huang, Zhijun Chen, Nitin K. Ingle |
2018-11-13 |
| 10062578 |
Methods for etch of metal and metal-oxide films |
Jingchun Zhang, Nitin K. Ingle |
2018-08-28 |
| 10062579 |
Selective SiN lateral recess |
Zhijun Chen, Jiayin Huang, Nitin K. Ingle |
2018-08-28 |
| 10026597 |
Hydrogen plasma based cleaning process for etch hardware |
Chirantha Rodrigo, Jingchun Zhang, Lili Ji, Nitin K. Ingle |
2018-07-17 |
| 9991134 |
Processing systems and methods for halide scavenging |
Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more |
2018-06-05 |
| 9887096 |
Differential silicon oxide etch |
Seung Ho Park, Yunyu Wang, Jingchun Zhang, Nitin K. Ingle |
2018-02-06 |
| 9875907 |
Self-aligned shielding of silicon oxide |
Fei Wang, Mikhail Korolik, Nitin K. Ingle, Robert Jan Visser |
2018-01-23 |
| 9859128 |
Self-aligned shielding of silicon oxide |
Fei Wang, Mikhail Korolik, Nitin K. Ingle, Robert Jan Visser |
2018-01-02 |