| 10153187 |
Methods and apparatus for transferring a substrate |
Sriskantharajah Thirunavukarasu, Eng Sheng Peh, Arvind Sundarrajan, Avinash Avula, Ellie Yieh |
2018-12-11 |
| 10128337 |
Methods for forming fin structures with desired profile for 3D structure semiconductor applications |
Jie Zhou, Zhong Qiang Hua, Chentsau Chris Ying, Ellie Yieh |
2018-11-13 |
| 10096512 |
Gapfill film modification for advanced CMP and recess flow |
Erica Chen, Ludovic Godet, Ellie Yieh |
2018-10-09 |
| 10095114 |
Process chamber for field guided exposure and method for implementing the process chamber |
Kartik Ramaswamy |
2018-10-09 |
| 10096496 |
Process chamber for etching low K and other dielectric films |
Dmitry Lubomirsky, Ellie Yieh, Sergey G. Belostotskiy |
2018-10-09 |
| 10096466 |
Pulsed plasma for film deposition |
Jun Xue, Ludovic Godet, Michael W. Stowell, Qiwei Liang, Douglas A. Buchberger, Jr. |
2018-10-09 |
| 10062602 |
Method of etching a porous dielectric material |
Nicolas Posseme, Sebastien Barnola, Olivier Joubert, Laurent Vallier |
2018-08-28 |
| 10049927 |
Seam-healing method upon supra-atmospheric process in diffusion promoting ambient |
Bencherki Mebarki, Sean S. Kang, Keith Tatseun Wong, He Ren, Mehul Naik +1 more |
2018-08-14 |
| 9993853 |
Method and apparatus for backside cleaning of substrates |
Sriskantharajah Thirunavukarasu, Jen Sern Lew, Arvind Sundarrajan |
2018-06-12 |
| 9978596 |
Self-aligned multiple spacer patterning schemes for advanced nanometer technology |
Ying Zhang, Uday Mitra, Praburam Gopalraja, Hua Chung |
2018-05-22 |
| 9947539 |
Plasma poisoning to enable selective deposition |
Ludovic Godet, Tobin Kaufman-Osborn |
2018-04-17 |
| 9911594 |
Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications |
Ellie Yieh, Ludovic Godet, Yin Fan |
2018-03-06 |
| 9896770 |
Methods of etching films with reduced surface roughness |
Benjamin Schmiege, Nitin K. Ingle, Jeffrey W. Anthis, Xikun Wang, Jie Liu +1 more |
2018-02-20 |
| 9865466 |
Silicide phase control by confinement |
Bencherki Mebarki, Ellie Yieh, Mehul Naik |
2018-01-09 |
| 9865484 |
Selective etch using material modification and RF pulsing |
Bhargav S. Citla, Chentsau Ying, Viachslav Babayan, Michael W. Stowell |
2018-01-09 |
