| 10096466 |
Pulsed plasma for film deposition |
Jun Xue, Ludovic Godet, Srinivas D. Nemani, Qiwei Liang, Douglas A. Buchberger, Jr. |
2018-10-09 |
| 10039157 |
Workpiece processing chamber having a rotary microwave plasma source |
Qiwei Liang |
2018-07-31 |
| 9997334 |
Seedless particles with carbon allotropes |
Bryce H. Anzelmo, Daniel Cook, Hossein-Ali Ghezelbash, Shreeyukta Singh, David Tanner |
2018-06-12 |
| 9928993 |
Workpiece processing chamber having a rotary microwave plasma antenna with slotted spiral waveguide |
— |
2018-03-27 |
| 9905400 |
Plasma reactor with non-power-absorbing dielectric gas shower plate assembly |
Qiwei Liang |
2018-02-27 |
| 9881775 |
Waveform for improved energy control of sputtered species |
— |
2018-01-30 |
| 9865484 |
Selective etch using material modification and RF pulsing |
Bhargav S. Citla, Chentsau Ying, Srinivas D. Nemani, Viachslav Babayan |
2018-01-09 |
