| 10157740 |
Selective deposition process utilizing polymer structure deactivation process |
Christine Y Ouyang |
2018-12-18 |
| 10108093 |
Controlling photo acid diffusion in lithography processes |
Peng Xie, Christopher Dennis Bencher |
2018-10-23 |
| 10096512 |
Gapfill film modification for advanced CMP and recess flow |
Erica Chen, Srinivas D. Nemani, Ellie Yieh |
2018-10-09 |
| 10096466 |
Pulsed plasma for film deposition |
Jun Xue, Srinivas D. Nemani, Michael W. Stowell, Qiwei Liang, Douglas A. Buchberger, Jr. |
2018-10-09 |
| 10048589 |
Field guided post exposure bake application for photoresist microbridge defects |
Sang Ki Nam, Christine Y Ouyang |
2018-08-14 |
| 9996006 |
Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake |
Christine Y Ouyang, Sang Ki Nam |
2018-06-12 |
| 9964863 |
Post exposure processing apparatus |
Viachslav Babayan, Kyle M. Hanson, Robert B. Moore |
2018-05-08 |
| 9947539 |
Plasma poisoning to enable selective deposition |
Srinivas D. Nemani, Tobin Kaufman-Osborn |
2018-04-17 |
| 9927709 |
Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake |
Christine Y Ouyang, Sang Ki Nam |
2018-03-27 |
| 9911594 |
Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications |
Srinivas D. Nemani, Ellie Yieh, Yin Fan |
2018-03-06 |
| 9864276 |
Laser annealing and electric field |
Christine Y Ouyang, Sang Ki Nam |
2018-01-09 |
| 9865464 |
Nanocrystalline diamond carbon film for 3D NAND hardmask application |
Yongmei Chen, Christopher S. Ngai, Jingjing Liu, Jun Xue, Chentsau Ying |
2018-01-09 |
