Issued Patents 2018
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10153139 | Multiple electrode substrate support assembly and phase control system | Yang Yang, Steven Lane, Lawrence Wong, Shahid Rauf, Andrew Nguyen +2 more | 2018-12-11 |
| 10153133 | Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion | Satoru Kobayashi, Hideo Sugai, Soonam Park, Dmitry Lubomirsky | 2018-12-11 |
| 10141166 | Method of real time in-situ chamber condition monitoring using sensors and RF communication | Lawrence Wong, Yang Yang, Steven Lane, Richard Fovell | 2018-11-27 |
| 10131994 | Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow | Andrew Nguyen, Kenneth S. Collins, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more | 2018-11-20 |
| 10115566 | Method and apparatus for controlling a magnetic field in a plasma chamber | Steven Lane, Tza-Jing Gung, Travis Koh, Joseph AuBuchon, Yang Yang | 2018-10-30 |
| 10095114 | Process chamber for field guided exposure and method for implementing the process chamber | Srinivas D. Nemani | 2018-10-09 |
| 10083883 | Wafer processing equipment having capacitive micro sensors | Leonard Tedeschi, Daniel T. McCormick, Robert Meagley | 2018-09-25 |
| 10067070 | Particle monitoring device | Leonard Tedeschi | 2018-09-04 |
| 10017857 | Method and apparatus for controlling plasma near the edge of a substrate | Andrew Nguyen, Yang Yang, Steven Lane, Lawrence Wong | 2018-07-10 |
| 9960776 | Method and apparatus for generating a variable clock used to control a component of a substrate processing system | Kenneth S. Collins, Satoru Kobayashi | 2018-05-01 |
| 9928987 | Inductively coupled plasma source with symmetrical RF feed | Jason A. Kenney, James D. Carducci, Kenneth S. Collins, Richard Fovell, Shahid Rauf | 2018-03-27 |
| 9911582 | Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control | Banqiu Wu, Ajay Kumar, Omkaram Nalamasu | 2018-03-06 |
| 9896769 | Inductively coupled plasma source with multiple dielectric windows and window-supporting structure | Andrew Nguyen, Kenneth S. Collins, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more | 2018-02-20 |
| 9870897 | Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates | James D. Carducci, Kenneth S. Collins, Richard Fovell, Jason A. Kenney, Shahid Rauf | 2018-01-16 |