Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10115572 | Methods for in-situ chamber clean in plasma etching processing chamber | Xiaoyi Chen, David Knick | 2018-10-30 |
| 9911582 | Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control | Ajay Kumar, Kartik Ramaswamy, Omkaram Nalamasu | 2018-03-06 |