| 10157731 |
Semiconductor processing apparatus with protective coating including amorphous phase |
Jennifer Y. Sun, Ren-Guan Duan |
2018-12-18 |
| 10153139 |
Multiple electrode substrate support assembly and phase control system |
Yang Yang, Kartik Ramaswamy, Steven Lane, Lawrence Wong, Shahid Rauf +2 more |
2018-12-11 |
| 10131994 |
Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow |
Andrew Nguyen, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more |
2018-11-20 |
| 9960776 |
Method and apparatus for generating a variable clock used to control a component of a substrate processing system |
Satoru Kobayashi, Kartik Ramaswamy |
2018-05-01 |
| 9928987 |
Inductively coupled plasma source with symmetrical RF feed |
Jason A. Kenney, James D. Carducci, Richard Fovell, Kartik Ramaswamy, Shahid Rauf |
2018-03-27 |
| 9896769 |
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure |
Andrew Nguyen, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more |
2018-02-20 |
| 9896376 |
Ceramic component formed ceramic portions bonded together with a halogen plasma resistant bonding agent |
Jennifer Y. Sun, Ren-Guan Duan |
2018-02-20 |
| 9870897 |
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates |
James D. Carducci, Richard Fovell, Jason A. Kenney, Kartik Ramaswamy, Shahid Rauf |
2018-01-16 |
