Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10121655 | Lateral plasma/radical source | Anantha K. Subramani, Kaushal Gangakhedkar, Abhishek Chowdhury, John C. Forster, Nattaworn Nuntaworanuch +2 more | 2018-11-06 |
| 9975758 | Wafer processing equipment having exposable sensing layers | Leonard Tedeschi, Lili Ji, Olivier Joubert, Dmitry Lubomirsky, Daniel T. McCormick | 2018-05-22 |
| 9978621 | Selective etch rate monitor | Timothy Joseph Franklin | 2018-05-22 |