JF

John C. Forster

Applied Materials: 4 patents #88 of 1,019Top 9%
Overall (2018): #42,757 of 503,207Top 9%
4
Patents 2018

Issued Patents 2018

Patent #TitleCo-InventorsDate
10121655 Lateral plasma/radical source Anantha K. Subramani, Kaushal Gangakhedkar, Abhishek Chowdhury, Nattaworn Nuntaworanuch, Kallol Bera +2 more 2018-11-06
10099245 Process kit for deposition and etching Zhenbin Ge, Alan A. Ritchie 2018-10-16
10047430 Self-ionized and inductively-coupled plasma for sputtering and resputtering Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more 2018-08-14
9984911 Electrostatic chuck design for high temperature RF applications Ryan Edwin Hanson, Manjunatha Koppa, Vijay D. Parkhe, Keith A. Miller 2018-05-29