Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10014213 | Selective bottom-up metal feature filling for interconnects | Kai-Hung Yu, Kandabara Tapily, Robert D. Clark | 2018-07-03 |
| 10008564 | Method of corner rounding and trimming of nanowires by microwave plasma | Kandabara Tapily, Ying Trickett, Chihiro TAMURA, Cory Wajda, Kaoru Maekawa | 2018-06-26 |
| 9735067 | Substrate tuning system and method using optical projection | Anton J. deVilliers, Daniel Fulford | 2017-08-15 |
| 9711449 | Ruthenium metal feature fill for interconnects | Kai-Hung Yu, Cory Wajda, Tadahiro Ishizaka, Takahiro Hakamata | 2017-07-18 |
| 9646898 | Methods for treating a substrate by optical projection of a correction pattern based on a detected spatial heat signature of the substrate | Anton J. deVilliers, Daniel Fulford | 2017-05-09 |
| 8785310 | Method of forming conformal metal silicide films | Toshio Hasegawa, Kunihiro Tada, Hideaki Yamasaki, David L. O'Meara | 2014-07-22 |
| 8334183 | Semiconductor device containing a buried threshold voltage adjustment layer and method of forming | Robert D. Clark | 2012-12-18 |
| 8197898 | Method and system for depositing a layer from light-induced vaporization of a solid precursor | — | 2012-06-12 |
| 7985680 | Method of forming aluminum-doped metal carbonitride gate electrodes | Toshio Hasegawa | 2011-07-26 |
| 7772073 | Semiconductor device containing a buried threshold voltage adjustment layer and method of forming | Robert D. Clark | 2010-08-10 |
| 7708835 | Film precursor tray for use in a film precursor evaporation system and method of using | Kenji Suzuki, Emmanuel Guidotti, Masamichi Hara, Daisuke Kuroiwa, Tadahiro Ishizaka | 2010-05-04 |
| 7678421 | Method for increasing deposition rates of metal layers from metal-carbonyl precursors | Kenji Suzuki, Emmanuel Guidotti, Fenton R. McFeely, Sandra G. Malhotra | 2010-03-16 |
| 7638002 | Multi-tray film precursor evaporation system and thin film deposition system incorporating same | Kenji Suzuki, Emmanuel Guidotti, Masamichi Hara, Daisuke Kuroiwa | 2009-12-29 |
| 7488512 | Method for preparing solid precursor tray for use in solid precursor evaporation system | Kenji Suzuki, Emmanuel Guidotti, Masamichi Hara, Daisuke Kuroiwa, Sandra G. Malhotra +2 more | 2009-02-10 |
| 7484315 | Replaceable precursor tray for use in a multi-tray solid precursor delivery system | Kenji Suzuki, Emmanuel Guidotti, Masamichi Hara, Daisuke Kuroiwa | 2009-02-03 |
| 7459396 | Method for thin film deposition using multi-tray film precursor evaporation system | Kenji Suzuki, Emmanuel Guidotti, Masamichi Hara, Daisuke Kuroiwa | 2008-12-02 |
| 7345184 | Method and system for refurbishing a metal carbonyl precursor | Kenji Suzuki, Fenton R. McFeely | 2008-03-18 |
| 7270848 | Method for increasing deposition rates of metal layers from metal-carbonyl precursors | Kenji Suzuki, Emmanuel Guidotti, Fenton R. McFeely, Sandra G. Malhotra | 2007-09-18 |
| 6652711 | Inductively-coupled plasma processing system | Jozef Brcka, John Drewery, Michael Grapperhaus, Glyn Reynolds, Mirko Vukovic +1 more | 2003-11-25 |
| 6626186 | Method for stabilizing the internal surface of a PECVD process chamber | Joseph T. Hillman, Steven P. Caliendo | 2003-09-30 |
| 6417626 | Immersed inductively—coupled plasma source | Jozef Brcka, John Drewery, Michael Grapperhaus, Glyn Reynolds, Mirko Vukovic +1 more | 2002-07-09 |
| 6368987 | Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions | Stanislaw Kopacz, Douglas A. Webb, Rene E. LeBlanc, Michael S. Ameen, Joseph T. Hillman +2 more | 2002-04-09 |
| 6302057 | Apparatus and method for electrically isolating an electrode in a PECVD process chamber | Michael G. Ward, Tayler Bao, Jerry Yeh, Joseph T. Hillman, Tugrul Yasar | 2001-10-16 |
| 6274496 | Method for single chamber processing of PECVD-Ti and CVD-TiN films for integrated contact/barrier applications in IC manufacturing | Michael G. Ward, Michael S. Ameen, Joseph T. Hillman | 2001-08-14 |
| 6161500 | Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions | Stanislaw Kopacz, Douglas A. Webb, Rene E. LeBlanc, Michael S. Ameen, Joseph T. Hillman +2 more | 2000-12-19 |