EG

Emmanuel Guidotti

TL Tokyo Electron Limited: 10 patents #748 of 5,567Top 15%
IBM: 2 patents #32,839 of 70,183Top 50%
PL Plasma-Therm: 1 patents #16 of 38Top 45%
📍 Chambéry, AZ: #1 of 1 inventorsTop 100%
Overall (All Time): #453,793 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
11075057 Device for treating an object with plasma Gilles Baujon, Yannick Pilloux, Patrick Rabinzohn, Julien Richard, Marc Segers +1 more 2021-07-27
7708835 Film precursor tray for use in a film precursor evaporation system and method of using Kenji Suzuki, Gerrit J. Leusink, Masamichi Hara, Daisuke Kuroiwa, Tadahiro Ishizaka 2010-05-04
7678421 Method for increasing deposition rates of metal layers from metal-carbonyl precursors Kenji Suzuki, Gerrit J. Leusink, Fenton R. McFeely, Sandra G. Malhotra 2010-03-16
7638002 Multi-tray film precursor evaporation system and thin film deposition system incorporating same Kenji Suzuki, Gerrit J. Leusink, Masamichi Hara, Daisuke Kuroiwa 2009-12-29
7488512 Method for preparing solid precursor tray for use in solid precursor evaporation system Kenji Suzuki, Gerrit J. Leusink, Masamichi Hara, Daisuke Kuroiwa, Sandra G. Malhotra +2 more 2009-02-10
7484315 Replaceable precursor tray for use in a multi-tray solid precursor delivery system Kenji Suzuki, Gerrit J. Leusink, Masamichi Hara, Daisuke Kuroiwa 2009-02-03
7459396 Method for thin film deposition using multi-tray film precursor evaporation system Kenji Suzuki, Gerrit J. Leusink, Masamichi Hara, Daisuke Kuroiwa 2008-12-02
7270848 Method for increasing deposition rates of metal layers from metal-carbonyl precursors Kenji Suzuki, Gerrit J. Leusink, Fenton R. McFeely, Sandra G. Malhotra 2007-09-18
6992011 Method and apparatus for removing material from chamber and wafer surfaces by high temperature hydrogen-containing plasma Takenao Nemoto, Gert Leusink 2006-01-31
6121140 Method of improving surface morphology and reducing resistivity of chemical vapor deposition-metal films Chantal Arena, Ronald Thomas Bertram, JR., Joseph T. Hillman 2000-09-19
6090705 Method of eliminating edge effect in chemical vapor deposition of a metal Chantal Arena, Ronald Thomas Bertram, JR., Joseph T. Hillman 2000-07-18