Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12188107 | Method of lithium extraction from sedimentary clay | Brett A. Rabe, Ryan M. Ravenelle | 2025-01-07 |
| 10541413 | Drying procedure in manufacturing process for cathode material | Shinji Arimoto, Kunio Tsuruta, Ryan Melsert | 2020-01-21 |
| D858596 | Tool shank | Phillip Major | 2019-09-03 |
| 6368987 | Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions | Stanislaw Kopacz, Douglas A. Webb, Gerrit J. Leusink, Michael S. Ameen, Joseph T. Hillman +2 more | 2002-04-09 |
| 6220202 | Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition | Robert F. Foster, Joseph T. Hillman | 2001-04-24 |
| 6161500 | Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions | Stanislaw Kopacz, Douglas A. Webb, Gerrit J. Leusink, Michael S. Ameen, Joseph T. Hillman +2 more | 2000-12-19 |
| 5866213 | Method for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor | Robert F. Foster, Joseph T. Hillman | 1999-02-02 |
| 5716870 | Method for producing titanium thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor | Robert F. Foster, Joseph T. Hillman | 1998-02-10 |
| 5665640 | Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor | Robert F. Foster, Joseph T. Hillman | 1997-09-09 |
| 5567243 | Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor | Robert F. Foster, Joseph T. Hillman | 1996-10-22 |
| 5542070 | Method for rapid development of software systems | Thomas J. Perry | 1996-07-30 |
| 5370739 | Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD | Robert F. Foster, Helen E. Rebenne, Carl Louis White, Rikhit Arora | 1994-12-06 |
| 5356476 | Semiconductor wafer processing method and apparatus with heat and gas flow control | Robert F. Foster, Helen E. Rebenne, Carl Louis White, Rikhit Arora | 1994-10-18 |
| 5273588 | Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means | Robert F. Foster, Helen E. Rebenne, Carl Louis White, Rikhit Arora | 1993-12-28 |