Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6140215 | Method and apparatus for low temperature deposition of CVD and PECVD films | Robert F. Foster, Joseph T. Hillman | 2000-10-31 |
| 5628829 | Method and apparatus for low temperature deposition of CVD and PECVD films | Robert F. Foster, Joseph T. Hillman | 1997-05-13 |
| 5610106 | Plasma enhanced chemical vapor deposition of titanium nitride using ammonia | Robert F. Foster, Joseph T. Hillman | 1997-03-11 |
| 5567483 | Process for plasma enhanced anneal of titanium nitride | Robert F. Foster, Joseph T. Hillman | 1996-10-22 |
| 5370739 | Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD | Robert F. Foster, Helen E. Rebenne, Rene E. LeBlanc, Carl Louis White | 1994-12-06 |
| 5356476 | Semiconductor wafer processing method and apparatus with heat and gas flow control | Robert F. Foster, Helen E. Rebenne, Rene E. LeBlanc, Carl Louis White | 1994-10-18 |
| 5273588 | Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means | Robert F. Foster, Helen E. Rebenne, Rene E. LeBlanc, Carl Louis White | 1993-12-28 |