Issued Patents All Time
Showing 126–150 of 155 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9360749 | Pellicle structure and method for forming the same | Yun-Yue Lin, Chia-Jen Chen, Anthony Yen | 2016-06-07 |
| 9341940 | Reticle and method of fabricating the same | Wen-Chang Hsueh, Chia-Jen Chen, Ta-Cheng Lien | 2016-05-17 |
| 9341937 | Lithography system and method for patterning photoresist layer on EUV mask | Yun-Yue Lin, Chia-Jen Chen, Anthony Yen | 2016-05-17 |
| 9310675 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Tao Huang, Chih-Tsung Shih, Chia-Jen Chen, Anthony Yen | 2016-04-12 |
| 9285673 | Assist feature for a photolithographic process | Tao Huang, Chia-Jen Chen, Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2016-03-15 |
| 9280046 | Method of fabricating mask | Anthony Yen, Chih-Tsung Shih, Ming-Jiun Yao, Yen-Cheng Lu, Shinn-Sheng Yu +1 more | 2016-03-08 |
| 9256142 | Pellicle mounting system and method | Yeh Lee-Chih, Chia-Jen Chen, Anthony Yen, Ming-Jiun Yao | 2016-02-09 |
| 9244341 | Photomask and method for forming the same | Chia-Jen Chen, Pei-Cheng Hsu, Anthony Yen | 2016-01-26 |
| 9213232 | Reflective mask and method of making same | Pei-Cheng Hsu, Chih-Tsung Shih, Chia-Jen Chen, Tsiao-Chen Wu, Shinn-Sheng Yu +1 more | 2015-12-15 |
| 9057961 | Systems and methods for lithography masks | Chih-Chiang Tu, Jong-Yuh Chang, Chia-Jen Chen, Chun-Lang Chen | 2015-06-16 |
| 8974988 | Mask and method for forming the same | Yun-Yue Lin, Ta-Cheng Lien, Anthony Yen, Chia-Jen Chen | 2015-03-10 |
| 8962222 | Photomask and method for forming the same | Pei-Cheng Hsu, Chia-Jen Chen, Anthony Yen | 2015-02-24 |
| 8916482 | Method of making a lithography mask | Yun-Yue Lin, Hung-Chang Hsieh, Chia-Jen Chen, Yih-Chen Su, Ta-Cheng Lien +1 more | 2014-12-23 |
| 8906583 | Stacked mask | Burn Jeng Lin, Sheng-Chi Chin | 2014-12-09 |
| 8877409 | Reflective mask and method of making same | Pei-Cheng Hsu, Chih-Tsung Shih, Chia-Jen Chen, Tsiao-Chen Wu, Shinn-Sheng Yu +1 more | 2014-11-04 |
| 8785083 | Systems and methods for lithography masks | Chih-Chiang Tu, Jong-Yuh Chang, Chia-Jen Chen, Chun-Lang Chen | 2014-07-22 |
| 8765330 | Phase shift mask for extreme ultraviolet lithography and method of fabricating same | Chia-Tsung Shih, Pei-Chung Hsu, Shinn-Sheng Yu, Tsiao-Chen Wu, Yen-Cheng Lu +3 more | 2014-07-01 |
| 8709682 | Mask and method for forming the mask | Chia-Jen Chen, Anthony Yen, Sheng-Chi Chin | 2014-04-29 |
| 8679707 | Method of fabricating a lithography mask | Yun-Yue Lin, Pei-Cheng Hsu, Chia-Jen Chen, Ta-Cheng Lien, Anthony Yen | 2014-03-25 |
| 8656318 | System and method for combined intraoverlay metrology and defect inspection | Chia-Jen Chen, Yeh Lee-Chih, Sheng-Chi Chin, Ting-Hao Hsu, Anthony Yen | 2014-02-18 |
| 8656319 | Optical proximity correction convergence control | Cheng-Cheng Kuo, Ching-Che Tsai, Tzu-Chun Lo, Chih-Wei Hsu, Hua-Tai Lin +4 more | 2014-02-18 |
| 8624345 | Photomask and photomask substrate with reduced light scattering properties | Ken Wu, Hung-Chang Hsieh, Chang-Cheng Hung, Luke Hsu, Ren-Guey Hsieh +1 more | 2014-01-07 |
| 8589828 | Reduce mask overlay error by removing film deposited on blank of mask | Chia-Jen Chen, Lee-Chih Yeh, Anthony Yen | 2013-11-19 |
| 8198118 | Method for forming a robust mask with reduced light scattering | Ken Wu, Hung-Chang Hsieh, Chang-Cheng Hung, Luke Hsu, Ren-Guey Hsieh +1 more | 2012-06-12 |
| 7999910 | System and method for manufacturing a mask for semiconductor processing | Chia-Jen Chen, Sheng-Chi Chin, Hung-Chang Hsieh, Burn Jeng Lin | 2011-08-16 |