Issued Patents All Time
Showing 151–155 of 155 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7924405 | Compensation of reticle flatness on focus deviation in optical lithography | Lee-Chih Yeh, Chia-Jen Chen, Tzu Yi Wang | 2011-04-12 |
| 7906252 | Multiple resist layer phase shift mask (PSM) blank and PSM formation method | Chia-Jen Chen, Hong-Chang Hsieh, Lee-Chih Yeh | 2011-03-15 |
| 7829248 | Pellicle stress relief | Burn Jeng Lin, Ming-Jiun Yao | 2010-11-09 |
| 7642532 | Aperture design for improving critical dimension accuracy and electron beam lithography throughput | Chia-Jen Chen, Hung-Chang Hsieh | 2010-01-05 |
| 7460251 | Dimension monitoring method and system | Shih-Ming Chang, Chen-Yuan Hsia, Wen-Chuan Wang, Chi-Lun Lu, Yen-Bin Huang +4 more | 2008-12-02 |