TW

Tzu Yi Wang

TSMC: 13 patents #2,298 of 12,232Top 20%
CC Cheng Uei Precision Industry Co.: 1 patents #297 of 502Top 60%
Overall (All Time): #337,505 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
12153351 Enhancing lithography operation for manufacturing semiconductor devices Yi-Chen Su, Ta-Cheng Lien 2024-11-26
12092952 Methods for forming extreme ultraviolet mask comprising magnetic material Kevin TANADY, Pei-Cheng Hsu, Ta-Cheng Lien, Hsin-Chang Lee 2024-09-17
12085843 Method of manufacturing EUV photo masks Hsin-Chang Lee, Pei-Cheng Hsu, Ta-Cheng Lien 2024-09-10
11906897 Method for extreme ultraviolet lithography mask treatment Pei-Cheng Hsu, Yih-Chen Su, Chi-Kuang Tsai, Ta-Cheng Lien, Jong-Yuh Chang +1 more 2024-02-20
11829076 Enhancing lithography operation for manufacturing semiconductor devices Yi-Chen Su, Ta-Cheng Lien 2023-11-28
11789356 Method of manufacturing EUV photo masks Hsin-Chang Lee, Pei-Cheng Hsu, Ta-Cheng Lien 2023-10-17
11550229 Enhancing lithography operation for manufacturing semiconductor devices Yi-Chen Su, Ta-Cheng Lien 2023-01-10
11388504 Headphone with pressure sensor Sheng Chieh Lo, Peng Yuan Lee 2022-07-12
11249384 Mask for EUV lithography and method of manufacturing the same Pei-Cheng Hsu, Chi-Ping Wen, Ta-Cheng Lien, Hsin-Chang Lee 2022-02-15
11237477 Reticle container Pei-Cheng Hsu, Ta-Cheng Lien, Hsin-Chang Lee 2022-02-01
11119398 EUV photo masks Hsin-Chang Lee, Pei-Cheng Hsu, Ping-Hsun Lin, Ta-Cheng Lien 2021-09-14
11106126 Method of manufacturing EUV photo masks Hsin-Chang Lee, Pei-Cheng Hsu, Ta-Cheng Lien 2021-08-31
11048158 Method for extreme ultraviolet lithography mask treatment Pei-Cheng Hsu, Yih-Chen Su, Chi-Kuang Tsai, Ta-Cheng Lien, Jong-Yuh Chang +1 more 2021-06-29
7924405 Compensation of reticle flatness on focus deviation in optical lithography Lee-Chih Yeh, Hsin-Chang Lee, Chia-Jen Chen 2011-04-12