Issued Patents All Time
Showing 76–100 of 155 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11360384 | Method of fabricating and servicing a photomask | Chun-Fu Yang, Pei-Cheng Hsu, Ta-Cheng Lien | 2022-06-14 |
| 11327405 | Method of manufacturing photo masks | Chien-Cheng Chen, Chia-Jen Chen, Shih-Ming Chang, Tran-Hui Shen, Yen-Cheng HO +1 more | 2022-05-10 |
| 11294292 | Particle removing assembly and method of cleaning mask for lithography | Chen-Yang Lin, Da-Wei Yu, Li-Hsin Wang, Kuan-Wen Lin, Chia-Jen Chen | 2022-04-05 |
| 11294274 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Chih-Cheng Lin, Jeng-Horng Chen | 2022-04-05 |
| 11294271 | Mask for extreme ultraviolet photolithography | Wen-Chang Hsueh, Ta-Cheng Lien | 2022-04-05 |
| 11287754 | Mask blank for lithography and method of manufacturing the same | Ming-Wei Chen, Ping-Hsun Lin | 2022-03-29 |
| 11249384 | Mask for EUV lithography and method of manufacturing the same | Pei-Cheng Hsu, Chi-Ping Wen, Tzu Yi Wang, Ta-Cheng Lien | 2022-02-15 |
| 11237477 | Reticle container | Pei-Cheng Hsu, Ta-Cheng Lien, Tzu Yi Wang | 2022-02-01 |
| 11221554 | EUV masks to prevent carbon contamination | Pei-Cheng Hsu, Ta-Cheng Lien | 2022-01-11 |
| 11215918 | Method of critical dimension control by oxygen and nitrogen plasma treatment in EUV mask | Pei-Cheng Hsu, Chun-Fu Yang, Ta-Cheng Lien | 2022-01-04 |
| 11204545 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Ching-Huang Chen, Hung-Yi Tsai, Ming-Wei Chen, Ta-Cheng Lien | 2021-12-21 |
| 11143954 | Mask patterns and method of manufacture | Wen-Chang Hsueh, Ta-Cheng Lien, Chia-Jen Chen | 2021-10-12 |
| 11143952 | Pellicle removal method | Chue-San Yoo, Chih-Chiang Tu, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh +2 more | 2021-10-12 |
| 11137684 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Chia-Jen Chen, Chih-Cheng Lin, Anthony Yen, Chin-Hsiang Lin | 2021-10-05 |
| 11119398 | EUV photo masks | Pei-Cheng Hsu, Ping-Hsun Lin, Ta-Cheng Lien, Tzu Yi Wang | 2021-09-14 |
| 11106126 | Method of manufacturing EUV photo masks | Pei-Cheng Hsu, Ta-Cheng Lien, Tzu Yi Wang | 2021-08-31 |
| 11086215 | Extreme ultraviolet mask with reduced mask shadowing effect and method of manufacturing the same | Yun-Yue Lin | 2021-08-10 |
| 11048158 | Method for extreme ultraviolet lithography mask treatment | Pei-Cheng Hsu, Yih-Chen Su, Chi-Kuang Tsai, Ta-Cheng Lien, Tzu Yi Wang +1 more | 2021-06-29 |
| 11042084 | Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask | Chia-Jen Chen, Chih-Cheng Lin, Ping-Hsun Lin | 2021-06-22 |
| 11029593 | Lithography mask with a black border regions and method of fabricating the same | Chin-Hsiang Lin, Chien-Cheng Chen, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2021-06-08 |
| 11022874 | Chromeless phase shift mask structure and process | Yun-Yue Lin | 2021-06-01 |
| 10996553 | Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same | Wen-Chang Hsueh, Huan-Ling Lee, Chia-Jen Chen | 2021-05-04 |
| 10871721 | Mask blank for lithography and method of manufacturing the same | Ming-Wei Chen, Ping-Hsun Lin | 2020-12-22 |
| 10866504 | Lithography mask with a black border region and method of fabricating the same | Chin-Hsiang Lin, Chien-Cheng Chen, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2020-12-15 |
| 10859906 | Extreme ultraviolet alignment marks | Yi-Fu Hsieh, Chih-Chiang Tu, Jong-Yuh Chang | 2020-12-08 |