Issued Patents All Time
Showing 276–300 of 351 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8183166 | Dielectric layer structure and manufacturing method thereof | — | 2012-05-22 |
| 8178289 | System and method for photolithography in semiconductor manufacturing | Kuei-Shun Chen, David Lu | 2012-05-15 |
| 8180141 | Wafer repair system | Burn Jeng Lin, Tsai-Shen Gau | 2012-05-15 |
| 8158306 | Method and system for combining photomasks to form semiconductor devices | Kuei-Shun Chen, Chih-Cheng Chiu | 2012-04-17 |
| 8153350 | Method and material for forming high etch resistant double exposure patterns | Ching-Yu Chang | 2012-04-10 |
| 8132503 | Method and apparatus for planarizing gap-filling material | Kuei-Shun Chen, T. Lin, Chia-Hsiang Lin | 2012-03-13 |
| 8119992 | System for overlay measurement in semiconductor manufacturing | Hsiao-Tzu Lu, Hua-Shu Wu, Chia-Hsiang Lin, Kuei-Shun Chen | 2012-02-21 |
| 8119473 | High temperature anneal for aluminum surface protection | Kuo-Bin Huang, Ssu-Yi Li, Ryan Chia-Jen Chen, Chi-Ming Yang, Chyi Shyuan Chern | 2012-02-21 |
| 8110345 | High resolution lithography system and method | Burn Jeng Lin | 2012-02-07 |
| 8101530 | Lithography patterning method | I-Hsiung Huang, Heng-Jen Lee, Heng-Hsin Liu | 2012-01-24 |
| 8101340 | Method of inhibiting photoresist pattern collapse | Ching-Yu Chang, Heng-Jen Lee, Hua-Tai Lin, Kuei-Shun Chen, Bang-Chein Ho +4 more | 2012-01-24 |
| 8088685 | Integration of bottom-up metal film deposition | Simon Su-Horng Lin, Chi-Ming Yang, Chyi Shyuan Chern | 2012-01-03 |
| 8068208 | System and method for improving immersion scanner overlay performance | Jui-Chung Peng, Tzung-Chi Fu, Chien-Hsun Lin, Chun-Hung Lin, Yao-Wen Guo +2 more | 2011-11-29 |
| 8046860 | System and method for removing particles in semiconductor manufacturing | Chen-Yuan Hsia, Chang-Cheng Hung, Chi-Lun Lu, Shih-Ming Chang, Wen-Chuan Wang +2 more | 2011-11-01 |
| 7986395 | Immersion lithography apparatus and methods | Ching-Yu Chang, Burn Jeng Lin | 2011-07-26 |
| 7972761 | Photoresist materials and photolithography process | Hsien-Cheng Wang, H. J. Lee, Ching-Yu Chang, Hua-Tai Lin, Burn Jeng Lin | 2011-07-05 |
| 7960821 | Dummy vias for damascene process | Kuei-Shun Chen, Vencent Chang, Lawrence Lin, Lai Chien Wen, Jhun Hua Chen | 2011-06-14 |
| 7960826 | Dielectric layer structure | — | 2011-06-14 |
| 7858532 | Dielectric layer structure and manufacturing method thereof | — | 2010-12-28 |
| 7838386 | Method and system for patterning alignment marks on a transparent substrate | Ruei-Hung Jang, Ya-Wen Lee, Tzu-Yang Wu, Sheng-Liang Pan, Tsai-Sheng Gau | 2010-11-23 |
| 7819980 | System and method for removing particles in semiconductor manufacturing | Chen-Yuan Hsia, Chang-Cheng Hung, Chi-Lun Lu, Shih-Ming Chang, Wen-Chuan Wang +2 more | 2010-10-26 |
| 7811720 | Utilizing compensation features in photolithography for semiconductor device fabrication | Kuei-Shun Chen, Chih-Cheng Chiu | 2010-10-12 |
| 7796249 | Mask haze early detection | Wen-Chuan Wang, Shy-Jay Lin, Te-Chih Huang, Chih-Ming Ke, Wei-Yu Su +2 more | 2010-09-14 |
| 7795601 | Method and apparatus to improve lithography throughput | Jui-Chung Peng, Yung-Cheng Chen, Shy-Jay Lin | 2010-09-14 |
| 7789576 | PEB embedded exposure apparatus | Feng-Ning Lee, Yung-Cheng Chen, Yao-Hwan Kao, Li-Jen Ko | 2010-09-07 |