Issued Patents All Time
Showing 51–75 of 113 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11187838 | Spectral filter for high-power fiber illumination sources | Andrew V. Hill, Ohad Bachar, Avi Abramov | 2021-11-30 |
| 11156846 | High-brightness illumination source for optical metrology | Andrew V. Hill, Ohad Bachar, Avi Abramov | 2021-10-26 |
| 11119417 | Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s) | Yuri Paskover, Eran Amit | 2021-09-14 |
| 11112704 | Mitigation of inaccuracies related to grating asymmetries in scatterometry measurements | Ido Adam, Vladimir Levinski, Yuval Lubashevsky | 2021-09-07 |
| 11101153 | Parameter-stable misregistration measurement amelioration in semiconductor devices | Vladimir Levinski, Yuri Paskover, Sharon Aharon | 2021-08-24 |
| 11085754 | Enhancing metrology target information content | Eran Amit, Nadav Gutman | 2021-08-10 |
| 11073768 | Metrology target for scanning metrology | Andrew V. Hill, Gilad Laredo, Yoel Feler, Mark Ghinovker, Vladimir Levinski | 2021-07-27 |
| 11060845 | Polarization measurements of metrology targets and corresponding target designs | Eran Amit, Barry Loevsky, Andrew V. Hill, Nuriel Amir, Vladimir Levinski +1 more | 2021-07-13 |
| 10976562 | Nano-structured non-polarizing beamsplitter | Dmitry Gorelik, Andrew V. Hill, Ohad Bachar, Daria Negri | 2021-04-13 |
| 10943838 | Measurement of overlay error using device inspection system | Choon Hoong Hoo, Fangren Ji, Liran Yerushalmi, Antonio Mani, Allen Park +3 more | 2021-03-09 |
| 10831108 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Tal Marciano, Barak Bringoltz, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld +17 more | 2020-11-10 |
| 10824079 | Diffraction based overlay scatterometry | Yuval Lubashevsky, Yuri Paskover, Vladimir Levinski | 2020-11-03 |
| 10684563 | On the fly target acquisition | Andrew V. Hill, Nadav Gutman, Yossi Simon, Alexander Novikov, Eugene Maslovsky | 2020-06-16 |
| 10663281 | Systems and methods for optimizing focus for imaging-based overlay metrology | Andrew V. Hill | 2020-05-26 |
| 10579768 | Process compatibility improvement by fill factor modulation | Vladimir Levinski, Eitan Hajaj, Tal Itzkovich, Sharon Aharon, Michael Adel +5 more | 2020-03-03 |
| 10551749 | Metrology targets with supplementary structures in an intermediate layer | Vladimir Levinski, Eran Amit, Nuriel Amir, Liran Yerushalmi, Amit Shaked | 2020-02-04 |
| 10533940 | Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology | Andrew V. Hill, Daniel Kandel, Ilan Sela, Ohad Bachar, Barak Bringoltz | 2020-01-14 |
| 10520832 | Topographic phase control for overlay measurement | Vladimir Levinski, Yuri Paskover, Yoni Shalibo | 2019-12-31 |
| 10458777 | Polarization measurements of metrology targets and corresponding target designs | Eran Amit, Barry Loevsky, Andrew V. Hill, Nuriel Amir, Vladimir Levinski +1 more | 2019-10-29 |
| 10444161 | Systems and methods for metrology with layer-specific illumination spectra | Daria Negri, Andrew V. Hill, Ohad Bachar, Vladimir Levinski, Yuri Paskover | 2019-10-15 |
| 10422508 | System and method for spectral tuning of broadband light sources | Andrew V. Hill, Ohad Bachar | 2019-09-24 |
| 10409171 | Overlay control with non-zero offset prediction | Michael Adel, William Pierson, Ady Levy, Pradeep Subrahmanyan, Liran Yerushalmi +4 more | 2019-09-10 |
| 10401738 | Overlay metrology using multiple parameter configurations | Andrew V. Hill, Andrei V. Shchegrov, Noam Sapiens | 2019-09-03 |
| 10401228 | Simultaneous capturing of overlay signals from multiple targets | Andrew V. Hill, Yuri Paskover, Yuval Lubashevsky | 2019-09-03 |
| 10371626 | System and method for generating multi-channel tunable illumination from a broadband source | Andrew V. Hill, Ohad Bachar | 2019-08-06 |