Issued Patents All Time
Showing 26–50 of 113 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11800212 | Multi-directional overlay metrology using multiple illumination parameters and isolated imaging | Yonatan Vaknin, Andrew V. Hill | 2023-10-24 |
| 11784097 | Measurement of overlay error using device inspection system | Choon Hoong Hoo, Fangren Ji, Liran Yerushalmi, Antonio Mani, Allen Park +3 more | 2023-10-10 |
| 11726410 | Multi-resolution overlay metrology targets | Eitan Hajaj, Shlomo Eisenbach, Anna Golotsvan, Yoav Grauer, Eugene Maslovsky | 2023-08-15 |
| 11719533 | Modulation of scanning velocity during overlay metrology | David L. Brown, Andrew V. Hill | 2023-08-08 |
| 11713959 | Overlay metrology using spectroscopic phase | Andrei V. Shchegrov, Ido Dolev, Yoram Uziel | 2023-08-01 |
| 11709433 | Device-like metrology targets | Vladimir Levinski, Eran Amit, Nuriel Amir, Liran Yerushalmi, Amit Shaked | 2023-07-25 |
| 11644419 | Measurement of properties of patterned photoresist | Roie Volkovich, Liran Yerushalmi, Yoram Uziel | 2023-05-09 |
| 11615974 | Fab management with dynamic sampling plans, optimized wafer measurement paths and optimized wafer transport, using quantum computing | Tzahi Grunzweig, Einat Peled, Anna Golotsvan | 2023-03-28 |
| 11592755 | Enhancing performance of overlay metrology | Andrew V. Hill, Yonatan Vaknin, Yossi Simon, Daria Negri, Vladimir Levinski +9 more | 2023-02-28 |
| 11573497 | System and method for measuring misregistration of semiconductor device wafers utilizing induced topography | Daria Negri, Gilad Laredo | 2023-02-07 |
| 11556738 | System and method for determining target feature focus in image-based overlay metrology | Etay Lavert, Yossi Simon, Dimitry Sanko, Avner Safrani | 2023-01-17 |
| 11531275 | Parallel scatterometry overlay metrology | Andrew V. Hill, Dmitry Gorelik | 2022-12-20 |
| 11526086 | Multi-field scanning overlay metrology | Andrew V. Hill | 2022-12-13 |
| 11512948 | Imaging system for buried metrology targets | Andrew V. Hill, Gilad Laredo, Avner Safrani | 2022-11-29 |
| 11428642 | Scanning scatterometry overlay measurement | Andrew V. Hill | 2022-08-30 |
| 11360398 | System and method for tilt calculation based on overlay metrology measurements | Roie Volkovich, Paul MacDonald, Ady Levy, Jincheng Pei, Jinyan Song | 2022-06-14 |
| 11359916 | Darkfield imaging of grating target structures for overlay measurement | Andrew V. Hill | 2022-06-14 |
| 11353799 | System and method for error reduction for metrology measurements | Roie Volkovich, Liran Yerushalmi, Anna Golotsvan, Rawi Dirawi, Chen Dror +3 more | 2022-06-07 |
| 11346657 | Measurement modes for overlay | Andrew V. Hill, Gilad Laredo | 2022-05-31 |
| 11314173 | Topographic phase control for overlay measurement | Vladimir Levinski, Yuri Paskover, Yoni Shalibo | 2022-04-26 |
| 11313669 | Systems and methods for optimizing focus for imaging-based overlay metrology | Andrew V. Hill | 2022-04-26 |
| 11300524 | Pupil-plane beam scanning for metrology | Andrew V. Hill, Avi Abramov, Asaf Granot, Andrei V. Shchegrov | 2022-04-12 |
| 11300405 | Grey-mode scanning scatterometry overlay metrology | Andrew V. Hill | 2022-04-12 |
| 11281111 | Off-axis illumination overlay measurement using two-diffracted orders imaging | Yoni Shalibo, Yuri Paskover, Vladimir Levinski, Shlomo Eisenbach, Gilad Laredo +1 more | 2022-03-22 |
| 11281112 | Method of measuring misregistration in the manufacture of topographic semiconductor device wafers | Daria Negri, Gilad Laredo | 2022-03-22 |