Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10431458 | Mask shrink layer for high aspect ratio dielectric etch | Eric A. Hudson, Kalman Pelhos, Hyunjong Shim, Merrett Wong | 2019-10-01 |
| 10170323 | Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etch | Eric A. Hudson, Kalman Pelhos, Hyung Joo Shin | 2019-01-01 |
| 9673058 | Method for etching features in dielectric layers | Scott Briggs, Eric A. Hudson, Leonid Belau, John Holland | 2017-06-06 |
| 9620377 | Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etch | Eric A. Hudson, Kalman Pelhos, Hyung Joo Shin | 2017-04-11 |
| 9543148 | Mask shrink layer for high aspect ratio dielectric etch | Eric A. Hudson, Kalman Pelhos, Hyunjong Shim, Merrett Wong | 2017-01-10 |
| 9236279 | Method of dielectric film treatment | Seokmin Yun, Ji Zhu, John deLarios | 2016-01-12 |
| 9159593 | Method of particle contaminant removal | Mark Kawaguchi, David Mui | 2015-10-13 |
| 8900374 | Method for substrate cleaning including movement of substrate below substrate cleaning module | Cheng-Yu Lin, Mark Kawaguchi, Russell Martin, Leon Ginzburg | 2014-12-02 |
| 8828145 | Method of particle contaminant removal | Yizhak Sabba, Seokmin Yun, Mark Kawaguchi, Dragan Podlesnik | 2014-09-09 |
| 8757177 | Multi-stage substrate cleaning method and apparatus | Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu Lin, Leon Ginzburg, Mark Kawaguchi | 2014-06-24 |
| 8534303 | Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus | Robert O'Donnell, Eric H. Lenz, Mike Ravkin, Alexander A. Yatskar | 2013-09-17 |
| 8440573 | Method and apparatus for pattern collapse free wet processing of semiconductor devices | Katrina Mikhaylichenko, Denis Syomin, Qian Fu, Glenn W. Gale, Shenjian Liu | 2013-05-14 |
| 8317934 | Multi-stage substrate cleaning method and apparatus | Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu Lin, Leon Ginzburg, Mark Kawaguchi | 2012-11-27 |
| 8277675 | Method of damaged low-k dielectric film layer removal | Seokmin Yun, Seong Hwan Cho, Shrikant Lohokare, John M. de Larios, Stephan Hoffmann | 2012-10-02 |
| 8127395 | Apparatus for isolated bevel edge clean and method for using the same | Hyungsuk Alexander Yoon, Andrew D. Bailey, III, Jason A. Ryder, Jeffrey G. Gasparitsch, Randy Johnson +1 more | 2012-03-06 |
| 8105441 | Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus | Robert O'Donnell, Eric H. Lenz, Mike Ravkin, Alexander A. Yatskar | 2012-01-31 |
| 8021512 | Method of preventing premature drying | Seokmin Yun | 2011-09-20 |
| 7946303 | Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus | Robert O'Donnell, Eric H. Lenz, Mike Ravkin, Alexander A. Yatskar | 2011-05-24 |
| 7939139 | Methods for atomic layer deposition (ALD) using a proximity meniscus | Mike Ravkin, Mikhail Korolik | 2011-05-10 |
| 7849554 | Apparatus and system for cleaning substrate | Cheng-Yu Lin, Mark Kawaguchi, Russell Martin, Leon Ginzburg | 2010-12-14 |
| 7758404 | Apparatus for cleaning edge of substrate and method for using the same | Jason A. Ryder, Ji Zhu, Fritz Redeker, John Parks, Charles N. Ditmore +1 more | 2010-07-20 |
| 7632376 | Method and apparatus for atomic layer deposition (ALD) in a proximity system | Mike Ravkin, Mikhail Korolik | 2009-12-15 |
| 7597765 | Post etch wafer surface cleaning with liquid meniscus | Ji Zhu, Seokmin Yun, John M. de Larios | 2009-10-06 |
| 7568488 | Enhanced wafer cleaning method | Seokmin Yun, John M. Boyd, John deLarios | 2009-08-04 |
| 7347915 | Plasma in-situ treatment of chemically amplified resist | Douglas Keil, Wan-Lin Chen, Eric A. Hudson, S. M. Reza Sadjadi, Andrew D. Bailey, III | 2008-03-25 |