Issued Patents All Time
Showing 25 most recent of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10593520 | Temperature adjusting apparatus and method for a focus ring | Lei Wu, Rubin Ye | 2020-03-17 |
| 8936696 | Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Roger Alan Lindley, Jingbao Liu, Keiji Horioka | 2015-01-20 |
| 8609546 | Pulsed bias plasma process to control microloading | Wonchul Lee, Qian Fu, Shenjian Liu | 2013-12-17 |
| 8518282 | Method of controlling etch microloading for a tungsten-containing layer | Wonchul Lee, Qian Fu, Shenjian Liu | 2013-08-27 |
| 8231799 | Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Paul Brillhart +2 more | 2012-07-31 |
| 8187415 | Plasma etch reactor with distribution of etch gases across a wafer surface and a polymer oxidizing gas in an independently fed center gas zone | Jong Mun Kim, Jingbao Liu | 2012-05-29 |
| 7879186 | Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Roger Alan Lindley, Jingbao Liu, Keiji Horioka | 2011-02-01 |
| 7838430 | Plasma control using dual cathode frequency mixing | Steven C. Shannon, Dennis S. Grimard, Theodoros Panagopoulos, Daniel J. Hoffman, Michael G. Chafin +4 more | 2010-11-23 |
| 7807064 | Halogen-free amorphous carbon mask etch having high selectivity to photoresist | Jong Mun Kim, Judy Wang, Ajey M. Joshi, Jingbao Liu | 2010-10-05 |
| 7736914 | Plasma control using dual cathode frequency mixing and controlling the level of polymer formation | Jingbao Liu, Taeho Shin | 2010-06-15 |
| 7629255 | Method for reducing microloading in etching high aspect ratio structures | Qian Fu, Shenjian Liu, Wonchul Lee | 2009-12-08 |
| 7540971 | Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Paul Brillhart +2 more | 2009-06-02 |
| 7541292 | Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Paul Brillhart +2 more | 2009-06-02 |
| 7431859 | Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Ezra Robert Gold, Paul Brillhart +2 more | 2008-10-07 |
| 7432210 | Process to open carbon based hardmask | Judy Wang, Shing-Li Sung, Shawming Ma | 2008-10-07 |
| 7422654 | Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor | Roger Alan Lindley, Jingbao Liu, Keiji Horioka | 2008-09-09 |
| 7374636 | Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor | Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Panyin Hughes +4 more | 2008-05-20 |
| 7316199 | Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber | Keiji Horioka, Chun Yan, Taeho Shin, Roger Alan Lindley, Qi Li +3 more | 2008-01-08 |
| 7316761 | Apparatus for uniformly etching a dielectric layer | Kenny L. Doan, Yunsang Kim, Mahmoud Dahimene, Jingbao Liu, Hongqing Shan +1 more | 2008-01-08 |
| 6916399 | Temperature controlled window with a fluid supply system | Yan Rozenzon, Gil Lavi, Evans Lee, Dong Ho Choi, Matt Hamrah +3 more | 2005-07-12 |
| 6829056 | Monitoring dimensions of features at different locations in the processing of substrates | Michael Barnes, John D. Holland, II, Hongqing Shan, Mohit Jain, Zhifeng Sui +5 more | 2004-12-07 |
| 6825618 | Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply | Hongching Shan, Claes Bjorkman, Kenny L. Doan, Mike Welch, Richard R. Mett | 2004-11-30 |
| 6797639 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongching Shan, Claes Bjorkman +3 more | 2004-09-28 |
| 6787475 | Flash step preparatory to dielectric etch | Zhuxu Wang, Jingbao Liu, Claes Bjorkman | 2004-09-07 |
| 6716302 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongching Shan, Claes Bjorkman +3 more | 2004-04-06 |