Issued Patents All Time
Showing 51–75 of 93 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8158481 | CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials | Tze-Chiang Chen, Meikei Ieong, Rajarao Jammy, Mukesh V. Khare, Chun-Yung Sung +2 more | 2012-04-17 |
| 8030157 | Liner protection in deep trench etching | Habib Hichri, Ahmad D. Katnani, Kaushik A. Kumar, Narender Rana, Hakeem B. S. Akinmade-Yusuff | 2011-10-04 |
| 8018005 | CMOS (complementary metal oxide semiconductor) devices having metal gate NFETs and poly-silicon gate PFETs | Bruce B. Doris, William K. Henson, Hongwen Yan | 2011-09-13 |
| 8008160 | Method and structure for forming trench DRAM with asymmetric strap | Kangguo Cheng, Xi Li | 2011-08-30 |
| 8008209 | Thermal gradient control of high aspect ratio etching and deposition processes | Michael Sievers, Kaushik A. Kumar, Andres Fernando Munoz | 2011-08-30 |
| 7943457 | Dual metal and dual dielectric integration for metal high-k FETs | Michael P. Chudzik, Wiliam K. Henson, Rashmi Jha, Yue Liang, Ravikumar Ramachandran | 2011-05-17 |
| 7919379 | Dielectric spacer removal | Eduard A. Cartier, Rashmi Jha, Sivananda K. Kanakasabapathy, Xi Li, Renee T. Mo +6 more | 2011-04-05 |
| 7892928 | Method of forming asymmetric spacers and methods of fabricating semiconductor device using asymmetric spacers | Kangguo Cheng, Xi Li | 2011-02-22 |
| 7871893 | Method for non-selective shallow trench isolation reactive ion etch for patterning hybrid-oriented devices compatible with high-performance highly-integrated logic devices | Gregory Costrini, David M. Dobuzinsky, Thomas S. Kanarsky, Munir D. Naeem, Christopher D. Sheraw | 2011-01-18 |
| 7859013 | Metal oxide field effect transistor with a sharp halo | Huajie Chen, Judson R. Holt, Rangarajan Jagannathan, Wesley C. Natzle, Michael Sievers | 2010-12-28 |
| 7820555 | Method of patterning multilayer metal gate structures for CMOS devices | Bruce B. Doris, Hongwen Yan, Ying Zhang | 2010-10-26 |
| 7776695 | Semiconductor device structure having low and high performance devices of same conductive type on same substrate | John C. Arnold, Dureseti Chidambarrao, Ying Li, Rajeev Malik, Shreesh Narasimha +2 more | 2010-08-17 |
| 7749830 | CMOS (complementary metal oxide semiconductor) devices having metal gate NFETS and poly-silicon gate PFETS | Bruce B. Doris, William K. Henson, Hongwen Yan | 2010-07-06 |
| 7691701 | Method of forming gate stack and structure thereof | Michael P. Belyansky, Siddarth A. Krishnan, Unoh Kwon, Naim Moumen, Ravikumar Ramachandran +3 more | 2010-04-06 |
| 7671421 | CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials | Tze-Chiang Chen, Meikei Ieong, Rajarao Jammy, Mukesh V. Khare, Chun-Yung Sung +2 more | 2010-03-02 |
| 7659616 | On-chip cooling systems for integrated circuits | Kaushik A. Kumar, Andres Fernando Munoz, Michael Sievers | 2010-02-09 |
| 7645356 | Method of processing wafers with resonant heating | Siddhartha Panda | 2010-01-12 |
| 7498271 | Nitrogen based plasma process for metal gate MOS device | Ricardo A. Donaton, Rashmi Jha, Siddarth A. Krishnan, Xi Li, Renee T. Mo +3 more | 2009-03-03 |
| 7476578 | Process for finFET spacer formation | Kangguo Cheng, Xi Li | 2009-01-13 |
| 7438822 | Apparatus and method for shielding a wafer from charged particles during plasma etching | Hongwen Yan, Brian L. Ji, Siddhartha Panda, Bomy Chen | 2008-10-21 |
| 7384835 | Metal oxide field effect transistor with a sharp halo and a method of forming the transistor | Huajie Chen, Judson R. Holt, Rangarajan Jagannathan, Wesley C. Natzle, Michael Sievers | 2008-06-10 |
| 7354867 | Etch process for improving yield of dielectric contacts on nickel silicides | Scott D. Allen, Kenneth Bandy, Sadanand V. Deshpande | 2008-04-08 |
| 7329602 | Wiring structure for integrated circuit with reduced intralevel capacitance | Bomy Chen, Mark C. Hakey, Hongwen Yan | 2008-02-12 |
| 7288482 | Silicon nitride etching methods | Siddhartha Panda, Srikanteswara Dakshina Murthy, Kamatchi Subramanian | 2007-10-30 |
| 7285775 | Endpoint detection for the patterning of layered materials | Michael Sievers, Siddhartha Panda | 2007-10-23 |