Issued Patents All Time
Showing 26–50 of 97 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7935927 | Method and apparatus for observing a specimen | Atsushi Miyamoto, Hidetoshi Morokuma | 2011-05-03 |
| 7894658 | Pattern inspection method and apparatus | Takashi Hiroi, Masahiro Watanabe, Chie Shishido, Aritoshi Sugimoto, Hiroshi Miyai +2 more | 2011-02-22 |
| 7889908 | Method and apparatus for measuring shape of a specimen | Atsushi Miyamoto, Hidetoshi Morokuma | 2011-02-15 |
| 7732761 | Method for measuring a pattern dimension using a scanning electron microscope | Chie Shishido | 2010-06-08 |
| 7692144 | Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus | Masahiro Watanabe, Takashi Hiroi, Hiroyuki Shinada, Yasutsugu Usami | 2010-04-06 |
| 7643138 | Method of inspecting a semiconductor device and an apparatus thereof | Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka +4 more | 2010-01-05 |
| 7633061 | Method and apparatus for measuring pattern dimensions | Chie Shishido, Wataru Nagatomo | 2009-12-15 |
| 7605364 | Sample and method for evaluating resolution of scanning electron microscope, and electron scanning microscope | Mayuka Oosaki, Chie Shishido, Hiroki Kawada | 2009-10-20 |
| 7511828 | Three-dimensional shape measuring unit, processing unit, and semiconductor device manufacturing method | Masahiro Watanabe, Toshihiko Nakata | 2009-03-31 |
| 7483560 | Method for measuring three dimensional shape of a fine pattern | Chle Shishido, Ryo Nakagaki, Kenji Watanabe, Yuya Toyoshima | 2009-01-27 |
| 7459712 | Method and apparatus of measuring pattern dimension and controlling semiconductor device process having an error revising unit | Hidetoshi Morokuma, Chie Shishido, Yuji Takagi | 2008-12-02 |
| 7457453 | Pattern inspection method and apparatus | Takashi Hiroi, Masahiro Watanabe, Chie Shishido, Aritoshi Sugimoto, Hiroshi Miyai +2 more | 2008-11-25 |
| 7417444 | Method and apparatus for inspecting integrated circuit pattern | Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda +12 more | 2008-08-26 |
| 7417723 | Method of inspecting a semiconductor device and an apparatus thereof | Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka +4 more | 2008-08-26 |
| 7381951 | Charged particle beam adjustment method and apparatus | Takashi Doi, Noriaki Arai, Hidetoshi Morokuma, Katsumi Setoguchi, Fumihiro Sasajima +1 more | 2008-06-03 |
| 7365325 | Method and apparatus for observing a specimen | Atsushi Miyamoto, Hidetoshi Morokuma | 2008-04-29 |
| 7335881 | Method of measuring dimensions of pattern | Chie Shishido, Yuji Takagi | 2008-02-26 |
| 7329889 | Electron beam apparatus and method with surface height calculator and a dual projection optical unit | Masahiro Watanabe, Takashi Hiroi, Hiroyuki Shinada, Yasutsugu Usami | 2008-02-12 |
| 7269280 | Method and its apparatus for inspecting a pattern | Takashi Hiroi, Masahiro Watanabe, Asahiro Kuni, Chie Shishido, Hiroshi Miyai +2 more | 2007-09-11 |
| 7266235 | Pattern inspection method and apparatus | Takashi Hiroi, Masahiro Watanabe, Chie Shishido, Aritoshi Sugimoto, Hiroshi Miyai +2 more | 2007-09-04 |
| 7260256 | Method and system for inspecting a pattern | Takashi Hiroi, Masahiro Watanabe, Asahiro Kuni, Hiroyuki Shinada, Mari Nozoe +2 more | 2007-08-21 |
| 7230243 | Method and apparatus for measuring three-dimensional shape of specimen by using SEM | Atsushi Miyamoto, Hidetoshi Morokuma, Chie Shishido, Mitsuji Ikeda, Yasutaka Toyoda | 2007-06-12 |
| 7230239 | Apparatus for inspecting three dimensional shape of a specimen and method of watching an etching process using the same | Hidetoshi Morokuma, Chie Shishido, Yuji Takagi | 2007-06-12 |
| 7216311 | System and method for evaluating a semiconductor device pattern, method for controlling process of forming a semiconductor device pattern and method for monitoring a semiconductor device manufacturing process | Chie Shishido, Ryo Nakagaki, Yuji Takagi | 2007-05-08 |
| 7173268 | Method of measuring pattern dimension and method of controlling semiconductor device process | Hidetoshi Morokuma, Chie Shishido, Yuji Takagi | 2007-02-06 |