Issued Patents All Time
Showing 1–25 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9159528 | Electron beam apparatus | Takashi Ogawa, Mitsuhiro Togashi | 2015-10-13 |
| 8604430 | Method and an apparatus of an inspection system using an electron beam | Yuko Iwabuchi, Hideo Todokoro, Hiroyoshi Mori, Mitsugu Sato, Mikio Ichihashi +6 more | 2013-12-10 |
| 8212227 | Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus | Masahiro Watanabe, Takashi Hiroi, Maki Tanaka, Hiroyuki Shinada | 2012-07-03 |
| 8134125 | Method and apparatus of an inspection system using an electron beam | Yuko Iwabuchi, Hideo Todokoro, Hiroyoshi Mori, Mitsugu Sato, Mikio Ichihashi +6 more | 2012-03-13 |
| 7977632 | Scanning electron microscope | Hideo Todokoro, Makoto Ezumi | 2011-07-12 |
| 7952074 | Method and apparatus for inspecting integrated circuit pattern | Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda +12 more | 2011-05-31 |
| 7692144 | Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus | Masahiro Watanabe, Takashi Hiroi, Maki Tanaka, Hiroyuki Shinada | 2010-04-06 |
| 7442923 | Scanning electron microscope | Hideo Todokoro, Makoto Ezumi | 2008-10-28 |
| 7439506 | Method and an apparatus of an inspection system using an electron beam | Yuko Iwabuchi, Hideo Todokoro, Hiroyoshi Mori, Mitsugu Sato, Mikio Ichihashi +6 more | 2008-10-21 |
| 7417444 | Method and apparatus for inspecting integrated circuit pattern | Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda +12 more | 2008-08-26 |
| 7329889 | Electron beam apparatus and method with surface height calculator and a dual projection optical unit | Masahiro Watanabe, Takashi Hiroi, Maki Tanaka, Hiroyuki Shinada | 2008-02-12 |
| 7242015 | Patterned wafer inspection method and apparatus therefor | Hiroyuki Shinada, Yusuke Yajima, Hisaya Murakoshi, Masaki Hasegawa, Mari Nozoe +4 more | 2007-07-10 |
| 7232996 | Method and an apparatus of an inspection system using an electron beam | Yuko Iwabuchi, Hideo Todokoro, Hiroyoshi Mori, Mitsugu Sato, Mikio Ichihashi +6 more | 2007-06-19 |
| 7130063 | Micropattern shape measuring system and method | Yasuhiro Mitsui, Isao Kawata, Yuya Toyoshima, Tadashi Otaka, Nobuyuki Iriki | 2006-10-31 |
| 7038767 | Three-dimensional micropattern profile measuring system and method | Yuya Toyoshima, Yasuhiro Mitsui, Isao Kawata, Tadashi Otaka | 2006-05-02 |
| 7026830 | Method and apparatus for inspecting integrated circuit pattern | Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda +12 more | 2006-04-11 |
| 7012252 | Method and an apparatus of an inspection system using an electron beam | Yuko Iwabuchi, Hideo Todokoro, Hiroyoshi Mori, Mitsugu Sato, Mikio Ichihashi +6 more | 2006-03-14 |
| 6987265 | Method and an apparatus of an inspection system using an electron beam | Yuko Iwabuchi, Hideo Todokoro, Hiroyoshi Mori, Mitsugu Sato, Mikio Ichihashi +6 more | 2006-01-17 |
| 6979823 | Patterned wafer inspection method and apparatus therefor | Hiroyuki Shinada, Yusuke Yajima, Hisaya Murakoshi, Masaki Hasegawa, Mari Nozoe +4 more | 2005-12-27 |
| 6919564 | Inspection method, apparatus and system for circuit pattern | Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Takashi Hiroi +2 more | 2005-07-19 |
| 6919577 | Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus | Masahiro Watanabe, Takashi Hiroi, Maki Tanaka, Hiroyuki Shinada | 2005-07-19 |
| 6903821 | Inspection method, apparatus and system for circuit pattern | Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Takashi Hiroi +2 more | 2005-06-07 |
| 6894790 | Micropattern shape measuring system and method | Yasuhiro Mitsui, Isao Kawata, Yuya Toyoshima, Tadashi Otaka, Nobuyuki Iriki | 2005-05-17 |
| 6797954 | Patterned wafer inspection method and apparatus therefor | Hiroyuki Shinada, Yusuke Yajima, Hisaya Murakoshi, Masaki Hasegawa, Mari Nozoe +4 more | 2004-09-28 |
| 6768113 | WORKPIECE HOLDER, SEMICONDUCTOR FABRICATING APPARATUS, SEMICONDUCTOR INSPECTING APPARATUS, CIRCUIT PATTERN INSPECTING APPARATUS, CHARGED PARTICLE BEAM APPLICATION APPARATUS, CALIBRATING SUBSTRATE, WORKPIECE HOLDING METHOD, CIRCUIT PATTERN INSPECTING METHOD, AND CHARGED PARTICLE BEAM APPLICATION METHOD | Hiroyuki Suzuki, Hiroyuki Shinada, Atsuko Takafuji, Shuji Sugiyama | 2004-07-27 |