Issued Patents All Time
Showing 26–50 of 157 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10685874 | Self-aligned cuts in an interconnect structure | Ruilong Xie, Hui Zang, Lei Sun, Lars Liebmann, Daniel Chanemougame | 2020-06-16 |
| 10644136 | Merged gate and source/drain contacts in a semiconductor device | Andy Wei | 2020-05-05 |
| 10586762 | Interrupted small block shape | Lars Liebmann | 2020-03-10 |
| 10566248 | Work function metal patterning for N-P spaces between active nanostructures using unitary isolation pillar | Daniel Chanemougame, Ruilong Xie, Chanro Park | 2020-02-18 |
| 10559503 | Methods, apparatus and system for a passthrough-based architecture | Tuhin Guha Neogi, Andy Chi-Hung Wei, Jia Zeng, Jongwook Kye, Jason E. Stephens +3 more | 2020-02-11 |
| 10475692 | Self aligned buried power rail | Nicholas V. LiCausi, Lars Liebmann | 2019-11-12 |
| 10460067 | Method of patterning target layer | Syed Muhammad Yasser Sherazi, Julien Ryckaert | 2019-10-29 |
| 10453750 | Stacked elongated nanoshapes of different semiconductor materials and structures that incorporate the nanoshapes | Bartlomiej Jan Pawlak, Ajey Poovannummoottil Jacob | 2019-10-22 |
| 10396026 | Precut metal lines | Andy Wei, Mark A. Zaleski | 2019-08-27 |
| 10366930 | Self-aligned gate cut isolation | Ruilong Xie, Chanro Park, Min Gyu Sung, Kangguo Cheng | 2019-07-30 |
| 10347583 | Methods of patterning dielectric layers for metallization and related structures | — | 2019-07-09 |
| 10262941 | Devices and methods for forming cross coupled contacts | Jason E. Stephens, Tuhin Guha Neogi, Kai Sun, Deniz E. Civay, David Pritchard +1 more | 2019-04-16 |
| 10249728 | Air-gap gate sidewall spacer and method | Daniel Chanemougame, Andre P. Labonte, Ruilong Xie, Lars Liebmann, Nigel G. Cave | 2019-04-02 |
| 10242867 | Gate pickup method using metal selectivity | Vimal Kamineni | 2019-03-26 |
| 10236350 | Method, apparatus and system for a high density middle of line flow | Tuhin Guha Neogi, Sudharshanan Raghunathan, Andy Chi-Hung Wei, Jason E. Stephens, Vikrant Chauhan +1 more | 2019-03-19 |
| 10229850 | Cut-first approach with self-alignment during line patterning | — | 2019-03-12 |
| 10211100 | Methods of forming an air gap adjacent a gate of a transistor and a gate contact above the active region of the transistor | Ruilong Xie, Lars Liebmann, Nigel G. Cave, Andre P. Labonte, Nicholas V. LiCausi +1 more | 2019-02-19 |
| 10204994 | Methods of forming a semiconductor device with a gate contact positioned above the active region | Ruilong Xie, Chanro Park, Andre P. Labonte, Lars Liebmann, Nigel G. Cave +2 more | 2019-02-12 |
| 10199271 | Self-aligned metal wire on contact structure and method for forming same | Ruilong Xie, Laertis Economikos, Lei Sun, Guoxiang Ning, Xunyuan Zhang | 2019-02-05 |
| 10181420 | Devices with chamfer-less vias multi-patterning and methods for forming chamfer-less vias | Jason E. Stephens, David Permana, Andy Wei, Mark A. Zaleski, Anbu Selvam K M Mahalingam +6 more | 2019-01-15 |
| 10083858 | Interconnection lines having variable widths and partially self-aligned continuity cuts | Nicholas V. LiCausi | 2018-09-25 |
| 10069011 | Method for fabricating a FinFET metallization architecture using a self-aligned contact etch | — | 2018-09-04 |
| 10056458 | Siloxane and organic-based MOL contact patterning | Chang Ho Maeng, Andy Wei, Anthony Ozzello, Bharat Krishnan, Haifeng Sheng +9 more | 2018-08-21 |
| 10056373 | Transistor contacts self-aligned in two dimensions | Andy Wei, Mark A. Zaleski, Tuhin Guha Neogi, Jason E. Stephens, Jongwook Kye +1 more | 2018-08-21 |
| 10049985 | Contact line having insulating spacer therein and method of forming same | Veeraraghavan S. Basker, Keith H. Tabakman, Patrick Carpenter, Michael V. Aquilino | 2018-08-14 |