Issued Patents All Time
Showing 51–75 of 133 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7834981 | Projection exposure apparatus, projection exposure method and projection objective | Hans-Juergen Rostalski, Heiko Feldmann | 2010-11-16 |
| 7751129 | Refractive projection objective for immersion lithography | Aurelian Dodoc, Hans-Juergen Rostalski | 2010-07-06 |
| 7738188 | Projection objective and projection exposure apparatus including the same | Aurelian Dodoc, Heiko Feldmann, Hans-Juergen Rostalski | 2010-06-15 |
| RE41350 | Catadioptric objective comprising two intermediate images | David Shafer, Alois Herkommer, Karl-Heinz Schuster, Gerd Füerter, Rudolph Von Büenau | 2010-05-25 |
| 7719772 | Catoptric objectives and systems using catoptric objectives | Han-Juergen Mann, Marco Pretorius | 2010-05-18 |
| 7697211 | Symmetrical objective having four lens groups for microlithography | David Shafer, Aurelian Dodoc, Johannes Zellner, Heiko Feldmann, Holger Walter +3 more | 2010-04-13 |
| 7697198 | Catadioptric projection objective | David Shafer, Alexander Epple, Aurelian Dodoc, Karl-Heinz Schuster | 2010-04-13 |
| 7692868 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Daniel Kraehmer, Norbert Wabra | 2010-04-06 |
| 7682031 | Catoptric objectives and systems using catoptric objectives | Hans-Jurgen Mann, David Shafer | 2010-03-23 |
| 7679821 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2010-03-16 |
| 7672047 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2010-03-02 |
| 7623620 | Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm | Hans-Jurgen Mann, Udo Dinger, Wolfgang Reinecke, Thomas Engel, Axel Zibold +3 more | 2009-11-24 |
| 7592598 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2009-09-22 |
| 7589903 | Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method | Susanne Beder, Heiko Feldmann, Wolfgang Singer, Toralf Gruner | 2009-09-15 |
| 7570343 | Microlithographic projection exposure apparatus | Aurelian Dodoc, Karl-Heinz Schuster, Joerg Mallmann, Hans-Juergen Rostalski, Hubert Holderer +6 more | 2009-08-04 |
| 7532306 | Microlithographic projection exposure apparatus | Aurelian Dodoc, Karl-Heinz Schuster, Joerg Mallmann, Hans-Juergen Rostalski | 2009-05-12 |
| 7511890 | Refractive optical imaging system, in particular projection objective for microlithography | David Shafer, Dieter Bader, Alexander Epple | 2009-03-31 |
| 7508580 | 8-mirror microlithography projection objective | Hans-Juergen Mann, Guenther Seitz | 2009-03-24 |
| 7492509 | Projection optical system | Hans-Juergen Rostalski, Aurelian Dodoc, Alexander Epple | 2009-02-17 |
| 7483121 | Microlithograph system | Daniel Kraehmer | 2009-01-27 |
| 7463423 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Daniel Kraehmer, Norbert Wabra | 2008-12-09 |
| 7463422 | Projection exposure apparatus | Vladimir Kamenow, Daniel Kraehmer, Michael Totzeck, Toralf Gruner, Aurelian Dodoc +4 more | 2008-12-09 |
| 7456408 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2008-11-25 |
| 7450301 | Reflective projection lens for EUV-photolithography | Hans-Juergen Mann, Russel Hudyma | 2008-11-11 |
| 7450312 | Optical projection lens system | David Shafer | 2008-11-11 |