Issued Patents All Time
Showing 26–50 of 133 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8416490 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2013-04-09 |
| 8363315 | Catadioptric projection objective with mirror group | Alexander Epple, Aurelian Dodoc, Hans-Juergen Mann, David Shafer | 2013-01-29 |
| 8355201 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2013-01-15 |
| 8345222 | High transmission, high aperture catadioptric projection objective and projection exposure apparatus | Daniel Kraehmer, Ralf Mueller, Thomas Schicketanz, Alexander Epple | 2013-01-01 |
| 8339701 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2012-12-25 |
| 8317345 | Catoptric objectives and systems using catoptric objectives | Hans-Juergen Mann, David Shafer | 2012-11-27 |
| 8289619 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2012-10-16 |
| 8208199 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2012-06-26 |
| 8208198 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2012-06-26 |
| 8199400 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple +2 more | 2012-06-12 |
| 8174676 | Method for correcting a lithography projection objective, and such a projection objective | Thomas Okon, Norbert Wabra, Toralf Gruner, Boris Bittner, Volker Graeschus | 2012-05-08 |
| 8169694 | Catoptric objectives and systems using catoptric objectives | Hans-Juergen Mann, Marco Pretorius | 2012-05-01 |
| 8134687 | Illumination system of a microlithographic exposure apparatus | Wolfgang Singer, Johannes Wangler, Rafael Egger | 2012-03-13 |
| 8107162 | Catadioptric projection objective with intermediate images | Aurelian Dodoc, Alexander Epple | 2012-01-31 |
| 8064040 | Projection objective, projection exposure apparatus and reflective reticle for microlithography | Aurelian Dodoc, Dieter Bader, Alexander Epple | 2011-11-22 |
| 8054557 | Lithography projection objective, and a method for correcting image defects of the same | Ulrich Loering, Vladan Blahnik, Daniel Kraehmer, Norbert Wabra | 2011-11-08 |
| 8027022 | Projection objective | Johannes Zellner, Hans-Juergen Mann | 2011-09-27 |
| 8004755 | Catoptric objectives and systems using catoptric objectives | Hans-Juergen Mann, David Shafer | 2011-08-23 |
| 7977651 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2011-07-12 |
| 7969663 | Projection objective for immersion lithography | Aurelian Dodoc, Hans-Juergen Rostalski | 2011-06-28 |
| 7965453 | Projection objective and projection exposure apparatus including the same | Aurelian Dodoc, Heiko Feldmann, Hans-Juergen Rostalski | 2011-06-21 |
| 7957069 | Projection optical system | Aurelian Dodoc | 2011-06-07 |
| 7920338 | Reduction projection objective and projection exposure apparatus including the same | Aurelian Dodoc | 2011-04-05 |
| 7869122 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2011-01-11 |
| 7859748 | Microlithographic reduction projection catadioptric objective | David Shafer, Russell Hudyma | 2010-12-28 |