Issued Patents All Time
Showing 76–100 of 133 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7426082 | Catadioptric projection objective with geometric beam splitting | David Shafer, Alexander Epple, Aurelian Dodoc, Helmut Beierl | 2008-09-16 |
| 7414781 | Catoptric objectives and systems using catoptric objectives | Hans-Juergen Mann, Marco Pretorius | 2008-08-19 |
| 7405808 | Optical system, in particular illumination system, of a microlithographic projection exposure apparatus | Toralf Gruner, Michael Totzeck, Damian Fiolka, Gerhard Fuerter | 2008-07-29 |
| 7400699 | Illumination system with raster elements of different sizes | Wolfgang Singer, Martin Antoni | 2008-07-15 |
| 7385756 | Catadioptric projection objective | David Shafer, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple | 2008-06-10 |
| 7382540 | Refractive projection objective | Hans-Juergen Rostalski, Karl-Heinz Schuster, Russell Hudyma, Rolf Freimann | 2008-06-03 |
| 7382536 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Birgit Enkisch, Michael Gerhard, Martin Brunotte +4 more | 2008-06-03 |
| 7372624 | 8-mirror microlithography projection objective | Hans-Juergen Mann, Guenther Seitz | 2008-05-13 |
| 7348565 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2008-03-25 |
| 7317508 | Optical system and method for the production of micro-structured components by microlithography | Daniel Kraehmer | 2008-01-08 |
| 7312847 | Refractive projection objective for immersion lithography | Hans-Juergen Rostalski | 2007-12-25 |
| 7310187 | Projection objective, especially for microlithography, and method for adjusting a projection objective | Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis | 2007-12-18 |
| 7271876 | Projection objective for microlithography | Gerhard Fuerter, Michael Gerhard | 2007-09-18 |
| 7218445 | Microlithographic reduction projection catadioptric objective | David Shafer, Russell Hudyma | 2007-05-15 |
| 7209286 | Objective with pupil obscuration | Hans-Jurgen Mann | 2007-04-24 |
| 7209292 | Projection objective, especially for microlithography, and method for adjusting a projection objective | Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis | 2007-04-24 |
| 7199922 | Reflective projection lens for EUV-photolithography | Hans-Juergen Mann, Russell Hudyma | 2007-04-03 |
| 7190527 | Refractive projection objective | Hans-Juergen Rostalski, Karl-Heinz Schuster, Russell Hudyma, Rolf Freimann | 2007-03-13 |
| 7186983 | Illumination system particularly for microlithography | Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster +2 more | 2007-03-06 |
| 7180667 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Birgit Enkisch, Michael Gerhard, Martin Brunotte +4 more | 2007-02-20 |
| 7177076 | 8-mirror microlithography projection objective | Hans-Jurgen Mann, Gunther Seitz | 2007-02-13 |
| 7167251 | Method of processing an optical substrate | Bernd Doerband, Rudolf Tannert | 2007-01-23 |
| 7154678 | Projection objective having adjacently mounted aspheric lens surfaces | Karl-Heinz Schuster, David Shafer, Helmut Beierl, Wolfgang Singer | 2006-12-26 |
| 7145720 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Birgit Enkisch, Michael Gerhard, Martin Brunotte +4 more | 2006-12-05 |
| 7136220 | Catadioptric reduction lens | David Shafer, Alexander Epple, Helmut Beierl, Aurelian Dodoc | 2006-11-14 |