Issued Patents All Time
Showing 101–125 of 133 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7126765 | Objective with fluoride crystal lenses | Daniel Krähmer, Toralf Gruner, Birgit Enkisch, Michael Gerhard, Martin Brunotte +4 more | 2006-10-24 |
| 6995930 | Catadioptric projection objective with geometric beam splitting | David Shafer, Alexander Epple, Aurelian Dodoc, Helmut Beierl | 2006-02-07 |
| 6992834 | Objective with birefringent lenses | Michael Totzeck, Vladimer Kamenov, Daniel Kraehmer | 2006-01-31 |
| 6985286 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Helmut Beierl, Gerhard Furter, Karl-Heinz Schuster | 2006-01-10 |
| 6930837 | Optical projection lens system | David Shafer | 2005-08-16 |
| 6927901 | Reflective projection lens for EUV-photolithography | Hans-Juergen Mann, Russell Hudyma | 2005-08-09 |
| 6906866 | Compact 1½-waist system for sub 100 nm ArF lithography | Russell Hudyma, Hans-Juergen Rostalski | 2005-06-14 |
| 6903802 | Projection objective having adjacently mounted aspheric lens surfaces | Karl-Heinz Schuster, David Shafer, Helmut Beierl, Wolfgang Singer | 2005-06-07 |
| 6894834 | Objective with pupil obscuration | Hans-Jurgen Mann | 2005-05-17 |
| 6891596 | Refractive projection objective for immersion lithography | Hans-Juergen Rostalski | 2005-05-10 |
| 6859328 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Karl-Hein Schuster, Udo Dinger, Wolfgang Singer +2 more | 2005-02-22 |
| 6806942 | Projection exposure system | Karl-Heinz Schuster, Toralf Gruner, Daniel Kraehmer, Wolfgang Singer, Alexander Epple +2 more | 2004-10-19 |
| 6791761 | Optical projection lens system | David Shafer | 2004-09-14 |
| 6788471 | Projection exposure apparatus for microlithography | Christian Wagner | 2004-09-07 |
| 6765729 | Catadioptric reduction lens | Jean-Claude Perrin, Alexander Epple | 2004-07-20 |
| 6717722 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Helmut Beierl, Gerhard Furter, Karl-Heinz Schuster | 2004-04-06 |
| 6710917 | 8-mirror microlithography projection objective | Hans-Jurgen Mann, Gunther Seitz | 2004-03-23 |
| 6665126 | Projection exposure lens with aspheric elements | David Shafer, Helmut Beierl | 2003-12-16 |
| 6646718 | Projection objective having adjacently mounted aspheric lens surfaces | Karl-Heinz Schuster, David Shafer, Helmut Beierl, Wolfgang Singer | 2003-11-11 |
| 6636350 | Microlithographic reduction projection catadioptric objective | David Shafer, Russell Hudyma | 2003-10-21 |
| 6611574 | Illumination system with reduced heat load | Wolfgang Singer, Martin Antoni | 2003-08-26 |
| 6600608 | Catadioptric objective comprising two intermediate images | David Shafer, Alois Herkommer, Karl-Heinz Schuster, Gerd Furter, Rudolf Von Bünau | 2003-07-29 |
| 6590715 | Optical projection system | David Shafer | 2003-07-08 |
| 6560031 | Optical projection lens system | David Shafer | 2003-05-06 |
| 6496306 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Helmut Beierl, Gerhard Furter, Karl-Heinz Schuster | 2002-12-17 |