Issued Patents All Time
Showing 201–225 of 251 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7834975 | Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly | Jacobus Burghoorn, Jan-Peter Hauschild, Martinus Hendrikus Antonius Leenders, Uwe Mickan, Roeland Nicolaas Maria Vanneer | 2010-11-16 |
| 7821650 | Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement | Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos | 2010-10-26 |
| 7791727 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Mircea Dusa, Antoine Gaston Marie Kiers, Maurits Van Der Schaar | 2010-09-07 |
| 7791732 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more | 2010-09-07 |
| 7791724 | Characterization of transmission losses in an optical system | Wilhelmus Maria Corbeij, Mircea Dusa, Markus Gerardus Martinus Maria Van Kraaij | 2010-09-07 |
| 7738103 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a parameter of a target pattern | Antione Gaston Marie Kiers, Hugo Augustinus Joseph Cramer | 2010-06-15 |
| 7724370 | Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell | Everhardus Cornelis Mos, Maurits Van Der Schaar | 2010-05-25 |
| 7710572 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Everhardus Cornelis Mos, Maurits Van Der Schaar, Thomas Leo Maria Hoogenboom | 2010-05-04 |
| 7692792 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Antoine Gaston Marie Kiers, Stefan Carolus Jacobus Antonius Keij | 2010-04-06 |
| 7656518 | Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus | Karel Diederick Van Der Mast, Maurits Van Der Schaar | 2010-02-02 |
| 7649636 | Optical metrology system and metrology mark characterization device | Nicolaas Petrus Van Der Aa, Robert Martinus Maria Mattheij, Henricus Gerhardus Ter Morsche | 2010-01-19 |
| 7643666 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Irwan Dani Setija | 2010-01-05 |
| 7629697 | Marker structure and method for controlling alignment of layers of a multi-layered substrate | Richard Johannes Franciscus Van Haren, Jacobus Burghoorn, Maurits Van Der Schaar, Bartolomeus Petrus Rijpers | 2009-12-08 |
| 7599064 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods | Everhardus Cornelis Mos, Maurits Van Der Schaar | 2009-10-06 |
| 7589832 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method | Yevgeniy Konstantinovich Shmarev | 2009-09-15 |
| 7586598 | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate | Reinder Teun Plug, Karel Diederick Van Der Mast | 2009-09-08 |
| 7580131 | Angularly resolved scatterometer and inspection method | — | 2009-08-25 |
| 7573584 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Everhardus Cornelis Mos, Maurits Van Der Schaar | 2009-08-11 |
| 7570358 | Angularly resolved scatterometer, inspection method, lithographic apparatus, lithographic processing cell device manufacturing method and alignment sensor | — | 2009-08-04 |
| 7564555 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Mircea Dusa, Everhardus Cornelis Mos, Maurits Van Der Schaar, Stefan Carolus Jacobus Antonius Keij | 2009-07-21 |
| 7564534 | Alignment system and method | Maarten Hoogerland, Boguslaw Gajdeczko | 2009-07-21 |
| 7532305 | Lithographic apparatus and device manufacturing method using overlay measurement | Everhardus Cornelis Mos, Maurits Van Der Schaar, Stefan Carolus Jacobus Antonius Keij | 2009-05-12 |
| 7532307 | Focus determination method, device manufacturing method, and mask | Maurits Van Der Schaar, Mircea Dusa, Antoine Gaston Marie Kiers | 2009-05-12 |
| 7518706 | Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly | Jan-Peter Hauschild, Martinus Hendrikus Antonius Leenders, Uwe Mickan, Roeland Nicolaas Maria Vanneer, Jacobus Burghoorn | 2009-04-14 |
| 7502103 | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate | Reinder Teun Plug, Karel Diederick Van Der Mast | 2009-03-10 |